Study of different triazole derivative inhibitors to protect copper against pitting corrosion

被引：58

作者：

Qafsaoui, W ^{[1
]}

Blanc, C ^{[1
]}

Pébère, N ^{[1
]}

Srhiri, A ^{[1
]}

Mankowski, G ^{[1
]}

机构：

[1] ENSCT, Lab Interfaces & Mat, UPRESA CNRS 5071, F-31077 Toulouse 04, France

来源：

JOURNAL OF APPLIED ELECTROCHEMISTRY | 2000年 / 30卷 / 08期

关键词：

copper; EIS; inhibition; pitting; XPS;

D O I：

10.1023/A:1004056527379

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Electrochemical experiments were performed to study the inhibitive effect towards copper corrosion of three organic compounds: namely, benzotriazole, 1-hydroxybenzotriazole and 3-amino 1,2,4-triazole. Statistical analysis of pit nucleation times showed that 3-amino 1,2,4-triazole exhibited the most significant inhibitive effect towards pitting. However, impedance measurements revealed that this compound produced a thinning of the passive film. This was corroborated by X-ray photoelectron spectroscopy. Results showed that copper pitting resistance could not be explained only by characterizing the protectiveness of the passive film.

引用

页码：959 / 966

页数：8

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