Freeform three-dimensional embedded polymer waveguides enabled by external-diffusion assisted two-photon lithography

被引：26

作者：

Ho Hoai Duc Nguyen ^{[1
]}

Hollenbach, Uwe ^{[1
]}

Ostrzinski, Ute ^{[2
]}

Pfeiffer, Karl ^{[2
]}

Hengsbach, Stefan ^{[1
]}

Mohr, Juergen ^{[1
]}

机构：

[1] Karlsruhe Inst Technol, IMT, D-76344 Eggenstein Leopoldshafen, Germany

[2] Micro Resist Technol GmbH MRT, Kopenicker Str 325, D-12555 Berlin, Germany

来源：

APPLIED OPTICS | 2016年 / 55卷 / 08期

关键词：

FABRICATION; VOXELS;

D O I：

10.1364/AO.55.001906

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

This paper introduces a unique method to fabricate free-form symmetrical three-dimensional single-mode waveguides embedded in a newly developed photopolymer. The fabrication process requires only one layer of a single material by combining two-photon lithography and external monomer diffusion resulting in a high refractive index contrast of 0.013. The cured material exhibits high chemical and thermal stability. Transmission loss of 0.37 dB/cm at 850 nm is achieved. Due to the fact that waveguide arrays are produced with high density, this technique could pave the way for three-dimensional optical interconnects at the board level with high complexity and bandwidth density. (C) 2016 Optical Society of America

引用

页码：1906 / 1912

页数：7

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