Fabrication of hexagonal-prism microstructure using monolithic etching process

被引：0

作者：

Yang, Hsiharng ^{[1
]}

Li, Fang-Yaung ^{[1
]}

Chein, Reiyu ^{[2
]}

机构：

[1] Natl Chung Hsing Univ, Grad Inst Precis Engn, Taichung 402, Taiwan

[2] Natl Chung Hsing Univ, Dept Mech Engn, Taichung 402, Taiwan

来源：

2006 1ST IEEE INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND MOLECULAR SYSTEMS, VOLS 1-3 | 2006年

关键词：

MEMS; < 110 > wafer; Hexagonal-like; structure; and Bulk etching;

D O I：

10.1109/NEMS.2006.334810

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this paper, we propose a novel method to fabricate three-dimensional hexagonal-like fillister structures on < 110 > silicon wafer by precise bulk etching in Micro Electro Mechanical Systems (MEMS). Photo mask is designed as a 50x50 array of equilateral parallelograms having side length of 80 mu m. The 40wt% KOH solution is used as the etchant. The created structure is used as the mold to cast the PDMS three-dimensional hexagonal-like structures. The created microstructure is believed to have great potential in developing high performance devices in optical, heat-exchanging, and biochemical applications.

引用

页码：1474 / +

页数：2

共 14 条

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