Predicting antenna pattern degradations in microstrip reflectarrays through interval arithmetic

被引:36
作者
Rocca, Paolo [1 ]
Poli, Lorenzo [1 ]
Anselmi, Nicola [1 ]
Salucci, Marco [1 ,2 ]
Massa, Andrea [1 ,2 ]
机构
[1] Univ Trento, ELEDIA UniTN, Via Sommarive 9, I-38123 Trento, Italy
[2] CNRS, ELEDIA Lab Signaux & Syst L2S, UMR8506, CS,UPS, 3 Rue Joliot Curie, F-91192 Gif Sur Yvette, France
关键词
antenna radiation patterns; reflectarray antennas; microstrip antenna arrays; antenna pattern degradations; microstrip reflectarrays; interval arithmetic; antenna power pattern; microstrip patches; electric antenna parameters; geometric antenna parameters; reliability; tolerance errors; APERTURE-COUPLED REFLECTARRAYS; TOLERANCE ANALYSIS; ARRAY ANTENNAS; LINEAR ARRAYS; VARIABLE SIZE; ELEMENTS; PATCHES; DESIGN;
D O I
10.1049/iet-map.2015.0837
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effects on the antenna power pattern of the tolerances in etching the microstrip patches and in the knowledge of the substrate characteristics of reflectarray antennas are predicted with an approach based on the arithmetic of intervals and the interval analysis (IA). The uncertainties on the geometric and electric antenna parameters are defined as intervals and the rules of IA are applied to determine the bounds of deviation of the actual power pattern with respect to the nominal pattern. A set of representative results is reported to validate the proposed approach and to show its reliability and efficiency when considering different tolerance errors and various operational conditions.
引用
收藏
页码:817 / 826
页数:10
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