Model for transport and reaction of defects and carriers within displacement cascades in gallium arsenide

被引:17
|
作者
Wampler, William R. [1 ]
Myers, Samuel M. [1 ]
机构
[1] Sandia Natl Labs, Radiat Solid Interact Dept 1111, Albuquerque, NM 87185 USA
关键词
MOLECULAR-DYNAMICS; RECOMBINATION; SEMICONDUCTORS; GAAS; SILICON; APPROXIMATIONS; SIMULATION; DENSITY; RANGE; FIELD;
D O I
10.1063/1.4906104
中图分类号
O59 [应用物理学];
学科分类号
摘要
A model is presented for recombination of charge carriers at evolving displacement damage in gallium arsenide, which includes clustering of the defects in atomic displacement cascades produced by neutron or ion irradiation. The carrier recombination model is based on an atomistic description of capture and emission of carriers by the defects with time evolution resulting from the migration and reaction of the defects. The physics and equations on which the model is based are presented, along with the details of the numerical methods used for their solution. The model uses a continuum description of diffusion, field-drift and reaction of carriers, and defects within a representative spherically symmetric cluster of defects. The initial radial defect profiles within the cluster were determined through pair-correlation-function analysis of the spatial distribution of defects obtained from the binary-collision code MARLOWE, using recoil energies for fission neutrons. Properties of the defects are discussed and values for their parameters are given, many of which were obtained from density functional theory. The model provides a basis for predicting the transient response of III-V heterojunction bipolar transistors to displacement damage from energetic particle irradiation.
引用
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页数:15
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