Characteristics of a Source for Oxide Coating Deposition by the Electron-Beam Evaporation of Dielectric Materials

被引:0
作者
Burdovitsin, Viktor [1 ]
Bakeev, Ilya [1 ]
Karpov, Kirill [1 ]
Kiki, Lionel Ngon A. [1 ]
Oks, Efim [1 ,2 ]
Vizir, Alexey [2 ]
机构
[1] Tomsk State Univ Control Syst & Radioelect, Lab Plasma Elect, Tomsk 634050, Russia
[2] Russian Acad Sci, Inst High Current Elect, Siberian Branch, Tomsk 634055, Russia
基金
俄罗斯科学基金会;
关键词
electron beam; plasma source; plasma cathode; electron source characteristics; oxygen environment; DISCHARGE;
D O I
10.3390/plasma5020020
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
We describe our investigations of a plasma-cathode electron source designed for the deposition of oxide coatings by the electron-beam evaporation of dielectric materials. Tests carried out using oxygen as the working gas showed that the source is operable without a change in parameters for at least ten hours of continuous operation. The current-voltage characteristics of the hollow-cathode plasma source in oxygen displayed a monotonically increasing character, and the voltage dependence of the discharge current was exponential. At the same time, for argon, nitrogen, and helium, the discharge voltage remained unchanged over a current ranging from 0.1 A to 1 A. A possible reason for these differences is the formation of oxides on the electrode surfaces for operation in the oxygen, impeding the discharge operation and requiring higher voltages for the same current as the other gases. The dependencies of the electron beam current on the accelerating voltage were monotonically increasing curves for all the gases except for helium, for which the beam current remained unchanged with increasing voltage over a range from two to ten kilovolts.
引用
收藏
页码:258 / 264
页数:7
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