Impact of Iridium Oxide Electrodes on the Ferroelectric Phase of Thin Hf0.5Zr0.5O2 Films

被引:34
作者
Mittmann, Terence [1 ]
Szyjka, Thomas [2 ]
Alex, Hsain [4 ]
Istrate, Marian Cosmin [5 ]
Lomenzo, Patrick D. [1 ]
Baumgarten, Lutz [2 ]
Mueller, Martina [3 ]
Jones, Jacob L. [4 ]
Pintilie, Lucian [5 ]
Mikolajick, Thomas [1 ,6 ]
Schroeder, Uwe [1 ]
机构
[1] NaMLab gGmbH, Noethnitzer Str 64a, D-01187 Dresden, Germany
[2] Forschungszentrum Julich, Peter Grunberg Inst PGI 6, D-52425 Julich, Germany
[3] Univ Konstanz, Fachbereich Phys, D-78464 Constance, Germany
[4] North Carolina State Univ, Dept Mat & Sci & Engn, Raleigh, NC 27695 USA
[5] Natl Inst Mat Phys, Magurele 077125, Romania
[6] Tech Univ Dresden, Chair Nanoelect Mat, D-01062 Dresden, Germany
来源
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS | 2021年 / 15卷 / 05期
基金
美国国家科学基金会;
关键词
ferroelectrics; hafnia; hydrogen; HZO; iridium oxide; oxygen vacancies;
D O I
10.1002/pssr.202100012
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thin film metal-ferroelectric-metal capacitors with an equal mixture of hafnium oxide and zirconium oxide as the ferroelectric material are fabricated using iridium oxide as the electrode material. The influence of the oxygen concentration in the electrodes during crystallization anneal on the ferroelectric properties is characterized by electrical, chemical, and structural methods. Forming gas, O-2, and N-2 annealing atmospheres significantly change the ferroelectric performance. The use of oxygen-deficient electrodes improves the stabilization of the ferroelectric orthorhombic phase and reduces the wake-up effect. It is found that oxygen-rich electrodes supply oxygen during anneal and reduce the amount of oxygen vacancies, but the nonferroelectric monoclinic phase is stabilized with a negative impact on the ferroelectric properties.
引用
收藏
页数:8
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共 46 条
  • [21] IrO2/Pb(Zr,Ti1-x)O-3(PZT)/Pt ferroelectric thin-film capacitors resistant to hydrogen-annealing damage
    KushidaAbdelghafar, K
    Miki, H
    Yano, F
    Fujisaki, Y
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1997, 36 (8A): : L1032 - L1034
  • [22] Depolarization as Driving Force in Antiferroelectric Hafnia and Ferroelectric Wake-Up
    Lomenzo, Patrick D.
    Richter, Claudia
    Mikolajick, Thomas
    Schroeder, Uwe
    [J]. ACS APPLIED ELECTRONIC MATERIALS, 2020, 2 (06) : 1583 - 1595
  • [23] Lomenzo PD, 2019, 2019 19TH NON-VOLATILE MEMORY TECHNOLOGY SYMPOSIUM (NVMTS 2019), DOI [10.1109/nvmts47818.2019.9043368, 10.1109/NVMTS47818.2019.9043368]
  • [24] The effects of layering in ferroelectric Si-doped HfO2 thin films
    Lomenzo, Patrick D.
    Takmeel, Qanit
    Zhou, Chuanzhen
    Liu, Yang
    Fancher, Chris M.
    Jones, Jacob L.
    Moghaddam, Saeed
    Nishida, Toshikazu
    [J]. APPLIED PHYSICS LETTERS, 2014, 105 (07)
  • [25] Influence of Oxygen Content on the Structure and Reliability of Ferroelectric HfxZr1-xO2 Layers
    Materano, Monica
    Mittmann, Terence
    Lomenzo, Patrick D.
    Zhou, Chuanzhen
    Jones, Jacob L.
    Falkowski, Max
    Kersch, Alfred
    Mikolajick, Thomas
    Schroeder, Uwe
    [J]. ACS APPLIED ELECTRONIC MATERIALS, 2020, 2 (11) : 3618 - 3626
  • [26] HfxZr1-xO2 thin films for semiconductor applications: An Hf- and Zr-ALD precursor comparison
    Materano, Monica
    Richter, Claudia
    Mikolajick, Thomas
    Schroeder, Uwe
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2020, 38 (02):
  • [27] The origin of ferroelectricity in Hf1-xZrxO2: A computational investigation and a surface energy model
    Materlik, R.
    Kuenneth, C.
    Kersch, A.
    [J]. JOURNAL OF APPLIED PHYSICS, 2015, 117 (13)
  • [28] Bulk Depolarization Fields as a Major Contributor to the Ferroelectric Reliability Performance in Lanthanum Doped Hf0.5Zr0.5O2 Capacitors
    Mehmood, Furqan
    Hoffmann, Michael
    Lomenzo, Patrick D.
    Richter, Claudia
    Materano, Monica
    Mikolajick, Thomas
    Schroeder, Uwe
    [J]. ADVANCED MATERIALS INTERFACES, 2019, 6 (21):
  • [29] Origin of Ferroelectric Phase in Undoped HfO2 Films Deposited by Sputtering
    Mittmann, Terence
    Materano, Monica
    Lomenzo, Patrick D.
    Park, Min Hyuk
    Stolichnov, Igor
    Cavalieri, Matteo
    Zhou, Chuanzhen
    Chung, Ching-Chang
    Jones, Jacob L.
    Szyjka, Thomas
    Mueller, Martina
    Kersch, Alfred
    Mikolajick, Thomas
    Schroeder, Uwe
    [J]. ADVANCED MATERIALS INTERFACES, 2019, 6 (11)
  • [30] Ferroelectric Zr0.5Hf0.5O2 thin films for nonvolatile memory applications
    Mueller, J.
    Boescke, T. S.
    Braeuhaus, D.
    Schroeder, U.
    Boettger, U.
    Sundqvist, J.
    Kuecher, P.
    Mikolajick, T.
    Frey, L.
    [J]. APPLIED PHYSICS LETTERS, 2011, 99 (11)