Field-electron emission from polyimide-ablated films

被引：5
作者：
Ma, H
Zhang, L
Yao, N
Bi, Z
Zhang, B [1 ]
Hu, H
机构：
[1] Zhengzhou Univ, Dept Phys, Zhengzhou 450052, Peoples R China
[2] Zhengzhou Univ Technol, Zhengzhou 450002, Peoples R China
[3] Chinese Acad Sci, Anhui Inst Opt & Fine Mech, Hefei 230031, Peoples R China
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2000年 / 71卷 / 03期
关键词：
D O I：
10.1007/s003390000511
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Polyimide-ablated film was deposited by using pulsed laser ablation of a polyimide target, and field-electron emission from the film was observed for the first time. The turn-on field of the polyimide-ablated film is 12 V/mu m. The current density is 0.725 mA/cm(2), and the emission sites density is on the order of 10(6)/cm(2) at the applied field of 24V/mu m. The field-electron emission measurements indicate that this kind of film could be a new cold cathode material. It is suggested that the graphite-like clusters contained in the film play an important role in the field-electron emission.
引用
收藏
页码：281 / 284
页数：4
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