Electronic properties of an epitaxial silicon oxynitride layer on a 6H-SiC(0001) surface:: A first-principles investigation

被引:17
作者
Devynck, Fabien [1 ]
Sljivancanin, Z.
Pasquarello, Alfredo
机构
[1] Ecole Polytech Fed Lausanne, Inst Theoret Phys, CH-1015 Lausanne, Switzerland
[2] IRRMA, Inst Romand Rech Numer Phys Mat, CH-1015 Lausanne, Switzerland
关键词
D O I
10.1063/1.2769949
中图分类号
O59 [应用物理学];
学科分类号
摘要
Using a density functional scheme, the authors investigate the electronic properties of an epitaxial silicon oxynitride layer on a 6H-SiC(0001) surface, as recently realized experimentally. Simulated scanning-tunneling-microscopy images of filled and empty states agree well with the experiment, lending support to the proposed atomic structure. In accord with the experiment, the local density of states indicates that the electronic band gap in the thin silicate layer at the surface is close to that of bulk SiO2. The authors show that this effect results from the surface of the epitaxial adlayer acting as a high-barrier potential for the SiC states induced in the oxide band gap.
引用
收藏
页数:3
相关论文
共 31 条
  • [1] Hydrogen-induced valence alternation state at SiO2 interfaces
    Afanas'ev, VV
    Stesmans, A
    [J]. PHYSICAL REVIEW LETTERS, 1998, 80 (23) : 5176 - 5179
  • [2] Mechanisms responsible for improvement of 4H-SiC/SiO2 interface properties by nitridation
    Afanas'ev, VV
    Stesmans, A
    Ciobanu, F
    Pensl, G
    Cheong, KY
    Dimitrijev, S
    [J]. APPLIED PHYSICS LETTERS, 2003, 82 (04) : 568 - 570
  • [3] Afanas'ev VV, 1997, PHYS STATUS SOLIDI A, V162, P321, DOI 10.1002/1521-396X(199707)162:1<321::AID-PSSA321>3.0.CO
  • [4] 2-F
  • [5] Epitaxially ideal oxide-semiconductor interfaces: Silicate adlayers on hexagonal (0001) and (000(1)over-bar) SiC surfaces
    Bernhardt, J
    Schardt, J
    Starke, U
    Heinz, K
    [J]. APPLIED PHYSICS LETTERS, 1999, 74 (08) : 1084 - 1086
  • [6] UNIFIED APPROACH FOR MOLECULAR-DYNAMICS AND DENSITY-FUNCTIONAL THEORY
    CAR, R
    PARRINELLO, M
    [J]. PHYSICAL REVIEW LETTERS, 1985, 55 (22) : 2471 - 2474
  • [7] Limits of the scaled shift correction to levels of interstitial defects in semiconductors
    Deak, P.
    Frauenheim, Th.
    Gali, A.
    [J]. PHYSICAL REVIEW B, 2007, 75 (15)
  • [8] Abrupt model interface for the 4H(1000)SiC-SiO2 interface
    Devynck, F
    Giustino, F
    Pasquarello, A
    [J]. MICROELECTRONIC ENGINEERING, 2005, 80 : 38 - 41
  • [9] DEVYNCK F, UNPUB
  • [10] Theory of atomic-scale dielectric permittivity at insulator interfaces
    Giustino, F
    Pasquarello, A
    [J]. PHYSICAL REVIEW B, 2005, 71 (14)