High efficiency pert cells on N-type silicon substrates

被引:40
作者
Zhao, JH [1 ]
Wang, AH [1 ]
Altermatt, PP [1 ]
Green, MA [1 ]
Rakotoniaina, JP [1 ]
Breitenstein, O [1 ]
机构
[1] Univ New S Wales, Ctr Photovolta Engn, Sydney, NSW 2052, Australia
来源
CONFERENCE RECORD OF THE TWENTY-NINTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE 2002 | 2002年
关键词
D O I
10.1109/PVSC.2002.1190495
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
High minority carrier lifetimes of a few milliseconds have been demonstrated both on CZ and FZ n-type silicon substrates. It is particularly interesting that the phosphorus doped n-type CZ wafers give minority carrier lifetimes nearly as high as those from the best p-type FZ silicon materials. This gives a good potential for very high performance on n-type CZ substrates. 21.1% and 21.9% efficiencies are reported for PERT (passivated emitter, rear totally-diffused) cells fabricated on these n-type mono-crystalline CZ and FZ silicon substrates, respectively. High open-circuit voltages approaching 700 mV have been demonstrated by these cells. Unfortunately, a non-uniform emitter saturation current has caused low fill factors for these cells, which will be investigated in future research.
引用
收藏
页码:218 / 221
页数:4
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