Radiation and polarization properties of free-exciton emission from AlN (0001) surface

被引:53
作者
Taniyasu, Yoshitaka [1 ]
Kasu, Makoto [1 ]
Makimoto, Toshiki [1 ]
机构
[1] NTT Corp, NTT Basic Res Labs, Atsugi, Kanagawa 2430198, Japan
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D O I
10.1063/1.2752727
中图分类号
O59 [应用物理学];
学科分类号
摘要
Free-exciton emission from AlN (0001) surface was characterized by angle-dependent photoluminescence (PL) measurement. As the radiation direction was inclined from the surface normal (c-axis direction), the emission intensity increased. This is because the optical transition between the conduction band and the top valence band is mainly allowed for light with the electric field parallel to the c-axis direction of AlN (E parallel to c) and consequently the free-exciton emission is strongly polarized for E parallel to c. By analyzing the angle-dependent PL intensities, the polarization ratio was estimated to be 0.995. This high polarization ratio results from the large negative crystal-field splitting energy. (c) 2007 American Institute of Physics.
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页数:3
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共 19 条
  • [1] Band-edge exciton states in AlN single crystals and epitaxial layers
    Chen, L
    Skromme, BJ
    Dalmau, RF
    Schlesser, R
    Sitar, Z
    Chen, C
    Sun, W
    Yang, J
    Khan, MA
    Nakarmi, ML
    Lin, JY
    Jiang, HX
    [J]. APPLIED PHYSICS LETTERS, 2004, 85 (19) : 4334 - 4336
  • [2] ABSORPTION, REFLECTANCE, AND LUMINESCENCE OF GAN EXPITAXIAL LAYERS
    DINGLE, R
    SELL, DD
    STOKOWSKI, SE
    ILEGEMS, M
    [J]. PHYSICAL REVIEW B-SOLID STATE, 1971, 4 (04): : 1211 - +
  • [3] Temperature dependence of the optical properties in hexagonal AlN
    Jiang, LF
    Shen, WZ
    Ogawa, H
    Guo, QX
    [J]. JOURNAL OF APPLIED PHYSICS, 2003, 94 (09) : 5704 - 5709
  • [4] III-nitride UV devices
    Khan, MA
    Shatalov, M
    Maruska, HP
    Wang, HM
    Kuokstis, E
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (10): : 7191 - 7206
  • [5] Band structure and fundamental optical transitions in wurtzite AlN
    Li, J
    Nam, KB
    Nakarmi, ML
    Lin, JY
    Jiang, HX
    Carrier, P
    Wei, SH
    [J]. APPLIED PHYSICS LETTERS, 2003, 83 (25) : 5163 - 5165
  • [6] Unique optical properties of AlGaN alloys and related ultraviolet emitters
    Nam, KB
    Li, J
    Nakarmi, ML
    Lin, JY
    Jiang, HX
    [J]. APPLIED PHYSICS LETTERS, 2004, 84 (25) : 5264 - 5266
  • [7] Exciton spectra of an AlN epitaxial film on (0001) sapphire substrate grown by low-pressure metalorganic vapor phase epitaxy
    Onuma, T
    Chichibu, SF
    Sota, T
    Asai, K
    Sumiya, S
    Shibata, T
    Tanaka, M
    [J]. APPLIED PHYSICS LETTERS, 2002, 81 (04) : 652 - 654
  • [8] Cathodoluminescence, photoluminescence, and reflectance of an aluminum nitride layer grown on silicon carbide substrate
    Prinz, G. i M.
    Ladenburger, A.
    Schirra, M.
    Feneberg, M.
    Thonke, K.
    Sauer, R.
    Taniyasu, Y.
    Kasu, M.
    Makimoto, T.
    [J]. JOURNAL OF APPLIED PHYSICS, 2007, 101 (02)
  • [9] Excitonic structure of bulk AlN from optical reflectivity and cathodoluminescence measurements
    Silveira, E
    Freitas, JA
    Glembocki, OJ
    Slack, GA
    Schowalter, LJ
    [J]. PHYSICAL REVIEW B, 2005, 71 (04):
  • [10] FIRST-PRINCIPLES CALCULATIONS OF EFFECTIVE-MASS PARAMETERS OF ALN AND GAN
    SUZUKI, M
    UENOYAMA, T
    YANASE, A
    [J]. PHYSICAL REVIEW B, 1995, 52 (11): : 8132 - 8139