Alkanethiol Self-Assembled Monolayers Formed on Silicon Substrates

被引：18

作者：

Sano, Hikaru ^{[1
]}

Ohno, Kotaro ^{[1
]}

Ichii, Takashi ^{[1
]}

Murase, Kuniaki ^{[1
]}

Sugimura, Hiroyuki ^{[1
]}

机构：

[1] Kyoto Univ, Dept Mat Sci & Engn, Sakyo Ku, Kyoto 6068501, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2010年 / 49卷 / 01期

关键词：

THERMAL-REACTIONS; ALKYL MONOLAYERS; SURFACES; ADSORPTION; INTERFACE; 1-ALKENES; ALDEHYDES; GOLD;

D O I：

10.1143/JJAP.49.01AE09

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have prepared alkanethiol monolayers, directly attached to a silicon substrate, by immersing hydrogen-terminated silicon in 1-hexadecanethiol solution at 150 degrees C. The evidence for the 1-hexadecanethiol monolayer formation was obtained and the resulting monolayers were compared with the monolayers formed from 1-hexadecanol using water contact angle measurements, X-ray photoelectron spectroscopy, ellipsometry, and atomic force microscopy. The densities of the alkyl chains in the 1-hexadecanethiol monolayers were lower than those of the 1-hexadecanol monolayer. The durability of these monolayers to 5% HF aqueous solution was also examined. The 1-hexadecanethiol monolayer is found to be less durable than the 1-hexadecanol monolayer. (C) 2010 The Japan Society of Applied Physics

引用

页数：5

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