共 50 条
- [1] Electromigration in Cu(Al) and Cu(Mn) damascene lines Hu, C.-K. (haohu@us.ibm.com), 1600, American Institute of Physics Inc. (111):
- [3] Electromigration-induced plastic deformation in Cu damascene interconnect lines as revealed by Synchrotron X-Ray Microdiffraction MATERIALS, TECHNOLOGY AND RELIABILITY OF LOW-K DIELECTRICS AND COPPER INTERCONNECTS, 2006, 914 : 295 - +
- [5] Electromigration in aluminum damascene lines STRESS INDUCED PHENOMENA IN METALLIZATION, 1999, 491 : 27 - 38
- [6] Electromigration of lower and upper Cu lines in dual-damascene Cu interconnects MATERIALS, TECHNOLOGY AND RELIABILITY FOR ADVANCED INTERCONNECTS AND LOW-K DIELECTRICS-2003, 2003, 766 : 133 - 138
- [8] Orientation and microstructure dependence of electromigration damage in damascene Cu interconnect lines ICOTOM 14: TEXTURES OF MATERIALS, PTS 1AND 2, 2005, 495-497 : 1443 - 1448
- [9] Microstructure and electromigration in copper damascene lines 1999 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 37TH ANNUAL, 1999, : 263 - 269