III-V interband 5.2 μm laser operating at 185 K

被引:31
作者
Flatte, ME [1 ]
Hasenberg, TC
Olesberg, JT
Anson, SA
Boggess, TF
Yan, C
McDaniel, DL
机构
[1] Univ Iowa, Dept Phys & Astron, Iowa City, IA 52242 USA
[2] Univ Iowa, Opt Sci & Technol Ctr, Iowa City, IA 52242 USA
[3] Hughes Res Labs, Malibu, CA 90265 USA
[4] Univ Iowa, Dept Elect & Comp Engn, Iowa City, IA 52242 USA
[5] Boeing Def & Space Grp, Kirtland AFB, NM 87117 USA
[6] USAF, Phillips Lab, Kirtland AFB, NM 87117 USA
关键词
D O I
10.1063/1.120499
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the operation of a III-V interband laser at a wavelength beyond 5 mu m and temperatures above 90 K. The active region consists of a strain compensated broken gap four layer superlattice of InAs/Ga0.6In0.4Sb/InAs/Al0.3Ga0.42In0.28As0.5Sb0.5 grown by molecular beam epitaxy. The maximum operating temperature under 2.01 mu m pulsed optical excitation was 185 K at a wavelength of 5.2 mu m, The peak pump intensity at the 80 K threshold was 62 kW/cm(2), and the characteristic temperature (T-0) of the threshold intensity was 37 K. This T-0 is comparable to the best observed values for 3-4.5 mu m lasers based on the InAs/GaInSb material system. (C) 1997 American Institute of Physics. [S0003-6951(97)04252-6].
引用
收藏
页码:3764 / 3766
页数:3
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