In situ Ru LII and LIII-edge X-ray absorption near edge structure of electrodeposited ruthenium dioxide films

被引：0
作者：
Stefan, IC [1 ]
Mo, YB [1 ]
Antonio, MR [1 ]
Scherson, DA [1 ]
机构：
[1] Case Western Reserve Univ, Dept Chem, Cleveland, OH 44106 USA
来源：
ELECTROCHEMICAL CAPACITOR AND HYBRID POWER SOURCES | 2002年 / 2002卷 / 07期
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D O I：
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中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
The electronic properties of electrodeposited Ru oxide films supported on Au have been examined in situ by Ru L-III and L-II-edge X-ray absorption near edge structure (XANES) in acid media. The results obtained are consistent with the main voltammetric peak centered at 0.7 V vs RHE as being attributed to a redox couple involving formally Ru3+ and Ru4+ sites in the lattice. A linear correlation was found between the extent of oxidation of the film as derived from a deconvolution of the spectral features and the charge as determined from coulometric analysis of the voltammetric curves. This observation suggests that only two Ru-based redox states are involved in this electrochemical process.
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页码：291 / 296
页数：6
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共 16 条
  • [1] WHITE LINES IN X-RAY ABSORPTION
    BROWN, M
    PEIERLS, RE
    STERN, EA
    [J]. PHYSICAL REVIEW B, 1977, 15 (02): : 738 - 744
  • [2] XANES AND EXAFS STUDIES ON THE IR-O BOND COVALENCY IN IONIC IRIDIUM PEROVSKITES
    CHOY, JH
    KIM, DK
    HWANG, SH
    DEMAZEAU, G
    JUNG, DY
    [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1995, 117 (33) : 8557 - 8566
  • [3] Soft XAFS study on the 4d electronic structure of ruthenium in complex perovskite oxide
    Choy, JH
    Kim, JY
    Hwang, SH
    Kim, SJ
    Demazeau, G
    [J]. INTERNATIONAL JOURNAL OF INORGANIC MATERIALS, 2000, 2 (01): : 61 - 70
  • [4] Cyclic voltammetric deposition of hydrous ruthenium oxide for electrochemical capacitors
    Hu, CC
    Huang, YH
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1999, 146 (07) : 2465 - 2471
  • [5] Multiplet effects in the Ru L2,3 x-ray-absorption spectra of Ru(IV) and Ru(V) compounds
    Hu, Z
    von Lips, H
    Golden, MS
    Fink, J
    Kaindl, G
    de Groot, FMF
    Ebbinghaus, S
    Reller, A
    [J]. PHYSICAL REVIEW B, 2000, 61 (08): : 5262 - 5266
  • [6] VALENCY AND STRUCTURE OF IRIDIUM IN ANODIC IRIDIUM OXIDE-FILMS
    HUPPAUFF, M
    LENGELER, B
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (03) : 598 - 602
  • [7] NATURAL WIDTHS OF ATOMIC K-LEVELS AND L-LEVELS,K-ALPHA X-RAY-LINES AND SEVERAL KLL AUGER LINES
    KRAUSE, MO
    OLIVER, JH
    [J]. JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1979, 8 (02) : 329 - 338
  • [8] Self-discharge and potential recovery phenomena at thermally and electrochemically prepared RuO2 supercapacitor electrodes
    Liu, TC
    Pell, WG
    Conway, BE
    [J]. ELECTROCHIMICA ACTA, 1997, 42 (23-24) : 3541 - 3552
  • [9] In situ Ru K-edge X-ray absorption fine structure studies of electroprecipitated ruthenium dioxide films with relevance to supercapacitor applications
    Mo, YB
    Antonio, MR
    Scherson, DA
    [J]. JOURNAL OF PHYSICAL CHEMISTRY B, 2000, 104 (42): : 9777 - 9779
  • [10] In situ iridium LIII-edge X-ray absorption and surface enhanced Raman spectroscopy of electrodeposited iridium oxide films in aqueous electrolytes
    Mo, YB
    Stefan, IC
    Cai, WB
    Dong, J
    Carey, P
    Scherson, DA
    [J]. JOURNAL OF PHYSICAL CHEMISTRY B, 2002, 106 (14) : 3681 - 3686
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