Negative electron affinity group III-nitride photocathode demonstrated as a high performance electron source

被引:47
作者
Machuca, F [1 ]
Liu, Z
Maldonado, JR
Coyle, ST
机构
[1] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
[2] ETEC Syst Inc, Hayward, CA 94545 USA
[3] Stanford Univ, Dept Phys, Stanford, CA 94305 USA
[4] Stanford Univ, Stanford Synchrotron Radiat Lab, Stanford, CA 94305 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2004年 / 22卷 / 06期
关键词
D O I
10.1116/1.1813453
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The need for a high performance (low energy spread < 0.5 eV. long lifetime > 3 months per spot, emission stability < 1% /h) electron source continues as part of the development of new e-beam writing and inspection tools. We present measurements from a group III-nitride (indium gallium nitride) photocathode in a demountable vacuum system to measure energy spread. lifetime. and preliminary blanking effects. We show the results of cathodes operating in ultrahigh vacuum (UHV), high vacuum (HV), and oxygen-rich backpressures. Our results show InGaN has a longitudinal energy spread of <300 meV in reflection mode, flat lifetimes of 60 h per illuminated spot where the yield changes by <10%, and stable emission with typical recoveries within 99% of original photocurrent for all blanking periods and vacuum conditions tested (0.5 to 10 min periods). (C) 2004 American Vacuum Society.
引用
收藏
页码:3565 / 3569
页数:5
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