Higher-order aberration corrector for an image-forming system in a transmission electron microscope

被引：36

作者：

Sawada, H. ^{[1
,2
]}

Sasaki, T. ^{[1
,2
]}

Hosokawa, F. ^{[1
]}

Yuasa, S. ^{[1
]}

Terao, M. ^{[1
]}

Kawazoe, M. ^{[1
]}

Nakamichi, T. ^{[1
]}

Kaneyama, T. ^{[1
,2
]}

Kondo, Y. ^{[2
]}

Kimoto, K. ^{[2
,3
]}

Suenaga, K. ^{[2
,4
]}

机构：

[1] JEOL Ltd, Tokyo 1968558, Japan

[2] Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1020075, Japan

[3] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan

[4] Natl Inst Adv Ind Sci & Technol, Res Ctr Adv Carbon Mat, Tsukuba, Ibaraki 3058565, Japan

来源：

ULTRAMICROSCOPY | 2010年 / 110卷 / 08期

基金：

日本科学技术振兴机构;

关键词：

Six-fold astigmatism; Diffractogram tableau; Aberration correction;

D O I：

10.1016/j.ultramic.2010.01.010

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

We developed a new electron optical system with three dodecapoles to compensate for spherical aberration and six-fold astigmatism, which generally remains in a two-hexapole type corrector. In this study, we applied the corrector for image-forming system in transmission electron microscope. Compensation for higher-order aberration was demonstrated through a diffractogram tableau using a triple three-fold astigmatism field system, which was then compared with a double hexapole field system. Using this electron optical system, six-fold astigmatism was measured to be less than 0.1 mm at an acceleration voltage of 60 kV, showing that the system successfully compensated for six-fold astigmatism. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：958 / 961

页数：4

共 27 条

[11] Towards sub-Å electron beams [J].

Krivanek, OL ;

Dellby, N ;

Lupini, AR .

ULTRAMICROSCOPY, 1999, 78 (1-4) :1-11

[12] Imaging the dynamic behaviour of individual retinal chromophores confined inside carbon nanotubes [J].

Liu, Zheng ;

Yanagi, Kazuhiro ;

Suenaga, Kazu ;

Kataura, Hiromichi ;

Iijima, Sumio .

NATURE NANOTECHNOLOGY, 2007, 2 (07) :422-425

[13] Advancing the hexapole Cs-corrector for the scanning transmission electron microscope [J].

Mueller, Heiko ;

Uhlemann, Stephan ;

Hartel, Peter ;

Haider, Maximilian .

MICROSCOPY AND MICROANALYSIS, 2006, 12 (06) :442-455

[14] Atomic-scale chemical imaging of composition and bonding by aberration-corrected microscopy [J].

Muller, D. A. ;

Kourkoutis, L. Fitting ;

Murfitt, M. ;

Song, J. H. ;

Hwang, H. Y. ;

Silcox, J. ;

Dellby, N. ;

Krivanek, O. L. .

SCIENCE, 2008, 319 (5866) :1073-1076

[15]

OKUNISHI E, 2006, P IMC, V16, P940

[16]

ROSE H, 1990, OPTIK, V85, P19

[17]

SASAKI T, 2009, IN PRESS

[18] Measurement method of aberration from Ronchigram by autocorrelation function [J].

Sawada, H. ;

Sannomiya, T. ;

Hosokawa, F. ;

Nakamichi, T. ;

Kaneyama, T. ;

Tomita, T. ;

Kondo, Y. ;

Tanaka, T. ;

Oshima, Y. ;

Tanishiro, Y. ;

Takayanagi, K. .

ULTRAMICROSCOPY, 2008, 108 (11) :1467-1475

[19]

SAWADA H, 2007, P MICROSC MICROANAL, V13, P880

[20] STEM imaging of 47-pm-separated atomic columns by a spherical aberration-corrected electron microscope with a 300-kV cold field emission gun [J].

Sawada, Hidetaka ;

Tanishiro, Yasumasa ;

Ohashi, Nobuhiro ;

Tomita, Takeshi ;

Hosokawa, Fumio ;

Kaneyama, Toshikatsu ;

Kondo, Yukihito ;

Takayanagi, Kunio .

JOURNAL OF ELECTRON MICROSCOPY, 2009, 58 (06) :357-361

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