Chemical, physical and electrochemical general methods used for deposition of various materials were tested for preparation of BaTiO3 films. Researchers are focusing on the influence of processing parameters on the stoichiometry and the properties of BaTiO3 films for each deposition method. Dielectric properties of BaTiO3 thin films prepared by different methods shown various values suggesting that the optimal parameters for deposition of BaTiO3 be not well known. Great efforts are concentrated on the economical aspect of the deposition process. In the case of BaTiO3 films, it is important to prepare crystallized films at low temperatures. The methods for deposition of BaTiO3 look into and develop continuous due to increase of the domain to use of BaTiO3 films.
机构:
Dept. of Elec. and Electron. Eng., Faculty of Engineering, Hachinohe Institute of Technology, 88-1 Ohbiraki, Myo, Hachinohe, Aomori 031-8501, JapanDept. of Elec. and Electron. Eng., Faculty of Engineering, Hachinohe Institute of Technology, 88-1 Ohbiraki, Myo, Hachinohe, Aomori 031-8501, Japan
Kakemoto, Hirofumi
Kakimoto, Ken-Ichi
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Dept. of Elec. and Electron. Eng., Faculty of Engineering, Hachinohe Institute of Technology, 88-1 Ohbiraki, Myo, Hachinohe, Aomori 031-8501, JapanDept. of Elec. and Electron. Eng., Faculty of Engineering, Hachinohe Institute of Technology, 88-1 Ohbiraki, Myo, Hachinohe, Aomori 031-8501, Japan
Kakimoto, Ken-Ichi
Fujita, Shigetaka
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Dept. of Elec. and Electron. Eng., Faculty of Engineering, Hachinohe Institute of Technology, 88-1 Ohbiraki, Myo, Hachinohe, Aomori 031-8501, JapanDept. of Elec. and Electron. Eng., Faculty of Engineering, Hachinohe Institute of Technology, 88-1 Ohbiraki, Myo, Hachinohe, Aomori 031-8501, Japan
Fujita, Shigetaka
Masuda, Yoichiro
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Dept. of Elec. and Electron. Eng., Faculty of Engineering, Hachinohe Institute of Technology, 88-1 Ohbiraki, Myo, Hachinohe, Aomori 031-8501, JapanDept. of Elec. and Electron. Eng., Faculty of Engineering, Hachinohe Institute of Technology, 88-1 Ohbiraki, Myo, Hachinohe, Aomori 031-8501, Japan
Masuda, Yoichiro
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers,
2000,
39
(9 B):
: 5374
-
5378
机构:
Tokyo Inst Technol, Ctr Mat Design, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 226, JapanTokyo Inst Technol, Ctr Mat Design, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 226, Japan