High-aspect-ratio structures produced by two-photon photopolimerization

被引：0

作者：

Jipa, F. ^{[1
]}

Zamfirescu, M. ^{[1
]}

Luculescu, C. ^{[1
]}

Dabu, R. ^{[1
]}

机构：

[1] Natl Inst Laser Plasma & Radiat Phys INFLPR, Bucharest 077125, Romania

来源：

JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS | 2010年 / 12卷 / 01期

关键词：

Two-photon absorption; Photonic structures; Photopolymers; SU-8; Aspect-ratio; 3-DIMENSIONAL STRUCTURES; FABRICATION; SU-8; MICROSTRUCTURES; LITHOGRAPHY; MICROFABRICATION; POLYMERIZATION; RESIST;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this work microstructures with high-aspect-ratio were produced by two-photon photopolymerization technique in SU-8 photoresist. When micrometer or submicrometer size features are realized, the standard protocol for processing the photoresist has to be adapted to the dimension of the desired structures. Using the suitable parameters of the protocol for exposure and development of the photopolymer, microstructures with aspect-ration more than 10:1 were obtained.

引用

页码：124 / 128

页数：5

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