Effect of photoresist grating thickness and pattern open width on performance of periodically poled LiNbO3 for a quasi-phase matching device

被引：6
作者：
Kwon, S. W.
Song, Y. S.
Yang, W. S.
Lee, H. M.
Kim, W. K.
Lee, H. Y.
Lee, D. Y.
机构：
[1] Daelim Coll Technol, Dept Mat Engn, Anyang 431715, South Korea
[2] Hankuk Aviat Univ, Dept Mat Engn, Goyang 412791, South Korea
[3] Korea Elect Technol Inst, Nano Biophoton Team, Songnam 463816, South Korea
来源：
OPTICAL MATERIALS | 2007年 / 29卷 / 08期
关键词：
periodically poled lithium niobate; photoresist grating; pattern open width; duty cycle; mid-infrared;
D O I：
10.1016/j.optmat.2006.02.008
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The 0.5 mm thick bulk periodically poled LiNbO3 (PPLN) crystals have been fabricated by an electric field poling process using a liquid electrode technique to investigate the effect of photoresist grating (PR) thickness and pattern open width on the periodicity and the duty cycles of PPLNs. No periodic deterioration of +Z, -Z surfaces and cross section (+Y) of PPLN with a domain-inverted period of 16.6 mu m and a 3.0 mu m thick PR is found. The average duty cycle of the PPLN is determined to be 49.9 +/- 3.3%. It suggests that a 3.0 mu m thick and a 16.6 mu m period PR with a pattern open width of 3.3 mu m are advantageous to the fabricated PPLN performance. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码：923 / 926
页数：4
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