Growth and surface morphology of textured NiO thin films deposited by off-axis RF magnetron sputtering

被引：35

作者：

Ryu, HW

Choi, GP

Hong, GJ

Park, JS ^{[1
]}

机构：

[1] Chosun Univ, Res Inst Energy Resources Technol, Kwangju 501759, South Korea

[2] Chosun Univ, Dept Phys, Kwangju 501759, South Korea

[3] Chosun Univ, Dept Adv Mat Engn, Kwangju 501759, South Korea

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2004年 / 43卷 / 8A期

关键词：

NiO thin film; textured structure; magnetron sputtering; surface morphology;

D O I：

10.1143/JJAP.43.5524

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Textured crystalline NiO thin films were grown on Si(100) substrates by off-axis RF magnetron sputtering without substrate heating using a NiO target. (100)-textured NiO films were obtained using pure Ar gas. On the other hand, (I I I)-textured NiO films were obtained using pure 02 gas. Also, the surface morphology and roughness of the NiO thin films were closely related to the type of sputtering gas and RF power.

引用

页码：5524 / 5525

页数：2

共 8 条

[1]

BERZIN AB, 1990, APPL PHYS LETT, V57, P90

[2]

Chopra K., 1969, THIN FILM PHENOMENA, P182

[3] Preparation and characteristics of nickel oxide thin film by controlled growth with sequential surface chemical reactions [J].