共 179 条
- [1] ABE T, 1994, P 2 INT C REACT PLAS
- [2] AIGRAIN P, 1960, P INT C SEMICONDUCTO, P224
- [3] ARNUSH D, 1997, UNPUB PHYS PLASMAS
- [4] ARNUSH D, 1995, PPG1538 UCLA
- [5] ARNUSH D, 1995, PLASMA PHYS CONTROL, V38, P1539
- [6] Polysilicon gate etching in high density plasmas .1. Process optimization using a chlorine-based chemistry [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (01): : 96 - 101
- [7] BENJAMIN N, 1990, P SOC PHOTO-OPT INS, V1392, P95
- [8] BENJAMIN NMP, 1991, PROCESS MODULE METRO, V1594, P153
- [9] Blackwell D. D., 1995, B AM PHYS SOC, V40, P1771
- [10] Two-dimensional imaging of a helicon discharge [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1997, 6 (04) : 569 - 576