Helicons - The past decade

被引:256
作者
Chen, FF [1 ]
Boswell, RW
机构
[1] Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90095 USA
[2] Australian Natl Univ, Res Sch Phys Sci & Engn, Canberra, ACT 0200, Australia
关键词
helicon; plasma discharges; plasma processing; plasma source; plasma waves;
D O I
10.1109/27.650899
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
First observed in gaseous plasmas in the early 1960's, helicon discharges lay like a sleeping giant until they emerged in the 1980's, when their usefulness as efficient plasma sources for processing microelectronic circuits for the burgeoning semiconductor industry became recognized, Research on helicons spread to many countries; new, challenging, unexpected problems arose, and these have spawned solutions and novel insights into the physical mechanisms in magnetized radio-frequency discharges, Among the most baffling puzzles were the reason for the high ionization efficiency of helicon discharges and the dominance of the right-hand polarized mode over the left-hand one, The most recent results indicate that a nonobvious resolution of these problems is at hand.
引用
收藏
页码:1245 / 1257
页数:13
相关论文
共 179 条
  • [1] ABE T, 1994, P 2 INT C REACT PLAS
  • [2] AIGRAIN P, 1960, P INT C SEMICONDUCTO, P224
  • [3] ARNUSH D, 1997, UNPUB PHYS PLASMAS
  • [4] ARNUSH D, 1995, PPG1538 UCLA
  • [5] ARNUSH D, 1995, PLASMA PHYS CONTROL, V38, P1539
  • [6] Polysilicon gate etching in high density plasmas .1. Process optimization using a chlorine-based chemistry
    Bell, FH
    Joubert, O
    Vallier, L
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (01): : 96 - 101
  • [7] BENJAMIN N, 1990, P SOC PHOTO-OPT INS, V1392, P95
  • [8] BENJAMIN NMP, 1991, PROCESS MODULE METRO, V1594, P153
  • [9] Blackwell D. D., 1995, B AM PHYS SOC, V40, P1771
  • [10] Two-dimensional imaging of a helicon discharge
    Blackwell, DD
    Chen, FF
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1997, 6 (04) : 569 - 576