Direct Correlation of Structural Domain Formation with the Metal Insulator Transition in a VO2 Nanobeam

被引:194
作者
Zhang, Shixiong [1 ]
Chou, Jung Yen [1 ]
Lauhon, Lincoln J. [1 ]
机构
[1] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
关键词
MOTT TRANSITION; OPTICAL-PROPERTIES; THIN-FILMS; PEIERLS; HUBBARD; VIEW; OXIDES;
D O I
10.1021/nl9028973
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The electrical resistance of single VO2 nanobeams was measured while simultaneously mapping the domain structure with Raman spectroscopy to investigate the relationship between structural domain formation and the metal-insulator transition. With increasing temperature, the nanobeams transformed from the insulating monoclinic M-1 phase to a mixture of the Mott-insulating M-2 and metallic rutile phases. Domain fractions were used to extract the temperature dependent resistivity of the M-2 phase, which showed an activated behavior consistent with the expected Mott-Hubbard gap. Metallic monoclinic phases were also produced by direct injection of charge into devices, decoupling the Mott metal-insulator transition from the monoclinic to rutile structural phase transition.
引用
收藏
页码:4527 / 4532
页数:6
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