Tunneling Intensity Enhancement of Resonant Tunneling Effects Caused by Surface Plasmon Excitations

被引:2
作者
Lee, Peng-Hsiao [1 ]
Lan, Yung-Chiang [1 ]
机构
[1] Natl Cheng Kung Univ, Inst Electroopt Sci & Engn, Tainan 701, Taiwan
关键词
Surface plasmons; Tunneling;
D O I
10.1007/s11468-010-9127-x
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This study investigates whether the resonant tunneling intensity of one groove of a metal film with periodic grooves on both surfaces can be enhanced by adjusting the relative permittivity of adjacent grooves of the emitting plane. As the relative permittivity of the side grooves of the emitting plane increases, the emission intensity of the center groove first increases but eventually saturates. This property is mainly attributable to concentration of incident intensity in the center groove of the incident plane. Larger numbers of lumped grooves or larger distances between two adjacent grooves increases the intensity of light entering the system, which ultimately increases the intensity of emitted light. This enhanced emission intensity achieved by resonant tunneling effects has potential applications in future plasmonic transistor designs.
引用
收藏
页码:183 / 187
页数:5
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