3D whispering-gallery-mode microlasers by direct laser writing and subsequent soft nanoimprint lithography

被引：14

作者：

Brenner, Philipp ^{[1
]}

Bar-On, Ofer ^{[2
]}

Siegle, Tobias ^{[3
]}

Leonhard, Tobias ^{[1
]}

Gvishi, Raz ^{[4
]}

Eschenbaum, Carsten ^{[1
,5
]}

Kalt, Heinz ^{[3
]}

Scheuer, Jacob ^{[2
]}

Lemmer, Uli ^{[1
,5
]}

机构：

[1] Karlsruhe Inst Technol, Light Technol Inst, D-76131 Karlsruhe, Germany

[2] Tel Aviv Univ, Dept Phys Elect, IL-69978 Tel Aviv, Israel

[3] Karlsruhe Inst Technol, Inst Appl Phys, D-76131 Karlsruhe, Germany

[4] Soreq NRC, Div Appl Phys, IL-81800 Yavne, Israel

[5] Karlsruhe Inst Technol, Inst Microstruct Technol, D-76344 Eggenstein Leopoldshafen, Germany

来源：

APPLIED OPTICS | 2017年 / 56卷 / 13期

关键词：

OPTICAL RESONATORS; RAYLEIGH-SCATTERING; SILICON MICRODISKS; FABRICATION; DEVICES; MICROCAVITIES; REPLICATION; TECHNOLOGY;

D O I：

10.1364/AO.56.003703

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We demonstrate the realization of 3D whispering-gallery-mode (WGM) microlasers by direct laser writing (DLW) and their replication by nanoimprint lithography using a soft mold technique ("soft NIL"). The combination of DLW as a method for rapid prototyping and soft NIL offers a fast track towards large scale fabrication of 3D passive and active optical components applicable to a wide variety of materials. A performance analysis shows that surface-scattering-limited Q-factors of replicated resonators as high as 1 x 10(5) at 635 nm can be achieved with this process combination. Lasing in the replicated WGM resonators is demonstrated by the incorporation of laser dyes in the target material. Low lasing thresholds in the order of 15 kW/cm(2) are obtained under ns-pulsed excitation. (C) 2017 Optical Society of America

引用

页码：3703 / 3708

页数：6

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