AlGaN-GaN heterostructure FETs with offset gate design

被引:39
作者
Gaska, R
Chen, Q
Yang, J
Khan, MA
Shur, MS
Ping, A
Adesida, I
机构
[1] RENSSELAER POLYTECH INST,DEPT ELECT COMP & SYST ENGN,TROY,NY 12180
[2] UNIV ILLINOIS,MICROELECT LAB,URBANA,IL 61801
关键词
field effect transistors;
D O I
10.1049/el:19970818
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The DC performance of AlGaN-GaN heterojunction field effect transistors (HFETs) with an offset gate design is reported for the first time. The breakdown voltage for these offset gate devices exhibited a strong dependence on the gate-to-drain separation and the maximum transconductance increased almost linearly with the source-to-gate distance.
引用
收藏
页码:1255 / 1257
页数:3
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