FEMTOSECOND VISIBLE LIGHT INDUCED TWO-PHOTON PHOTOPOLYMERIZATION FOR 3D MICRO/NANOSTRUCTURING IN PHOTORESISTS AND PHOTOPOLYMERS

被引:38
作者
Malinauskas, M. [1 ]
Purlys, V.
Rutkauskas, M.
Gaidukeviciute, A.
Gadonas, R.
机构
[1] Vilnius State Univ, Fac Phys, Dept Quantum Elect, LT-10223 Vilnius, Lithuania
来源
LITHUANIAN JOURNAL OF PHYSICS | 2010年 / 50卷 / 02期
关键词
two-photon absorption; laser processing; photopolymerization; micro/nanofabrication; three-dimensional structures; tissue engineering;
D O I
10.3952/lithjphys.50203
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Laser two-photon polymerization (LTPP) has been widely reported as a tool for three-dimensional micro/nanofabrication. Femtosecond lasers are employed to form nanostructures in photosensitive resins with subwavelength resolution. We demonstrate high throughput large scanning area LTPP system based on linear motor driven stages combined with Yb:KGW high repetition rate (312.5 kHz) amplified laser as irradiation source (515 nm second harmonic's wavelength). Femtosecond green light can be focused to a smaller diffraction limited spot and provides higher structuring resolution comparing to commonly used Ti:sapphire lasers (operating at NIR wavelengths) used for LTPP. Additionally, shorter irradiation wavelength enables to process more of widely used photosensitive materials. The system capacitates production of nanostructures having 200 nm lateral resolution with high repeatability. By modifying focusing optics there is a possibility to scale up the fabrication: reduction of resolution results in shortening of fabrication time. The system enables formation of 3D structures with size varying from tens of microns to tens of millimetres. Most of the materials commonly used for photopolymerization technology (various blends of acrylates, hybrid organic-inorganic materials, and epoxy resins) are well suitable for processing with the constructed LTPP system.
引用
收藏
页码:201 / 207
页数:7
相关论文
共 10 条
[1]  
Chichkov BN, 2005, MATER RES SOC SYMP P, V850, P179
[2]   Fabrication of three-dimensional structures by three-photon polymerization [J].
Farsari, M ;
Filippidis, G ;
Fotakis, C .
OPTICS LETTERS, 2005, 30 (23) :3180-3182
[3]   65 nm feature sizes using visible wavelength 3-D multiphoton lithography [J].
Haske, Wojciech ;
Chen, Vincent W. ;
Hales, Joel M. ;
Dong, Wenting ;
Barlow, Stephen ;
Marder, Seth R. ;
Perry, Joseph W. .
OPTICS EXPRESS, 2007, 15 (06) :3426-3436
[4]   Two-photon lithography of nanorods in SU-8 photoresist [J].
Juodkazis, S ;
Mizeikis, V ;
Seet, KK ;
Miwa, M ;
Misawa, H .
NANOTECHNOLOGY, 2005, 16 (06) :846-849
[5]   Finer features for functional microdevices - Micromachines can be created with higher resolution using two-photon absorption. [J].
Kawata, S ;
Sun, HB ;
Tanaka, T ;
Takada, K .
NATURE, 2001, 412 (6848) :697-698
[6]   Advances in 3D nano/microfabrication using two-photon initiated polymerization [J].
Lee, Kwang-Sup ;
Kim, Ran Hee ;
Yang, Dong-Yol ;
Park, Sang Hu .
PROGRESS IN POLYMER SCIENCE, 2008, 33 (06) :631-681
[7]   Multiphoton polymerization [J].
Li, Linjie ;
Fourkas, John T. .
MATERIALS TODAY, 2007, 10 (06) :30-37
[8]   Investigation of three-dimensional pattern collapse owing to surface tension using an imperfection finite element model [J].
Park, Sang-Hu ;
Kim, Kwang Ho ;
Lim, Tae Woo ;
Yang, Dong-Yol ;
Lee, Kwang-Sup .
MICROELECTRONIC ENGINEERING, 2008, 85 (02) :432-439
[9]   Two-photon photopolymerization and 3D lithographic microfabrication [J].
Sun, HB ;
Kawata, S .
NMR - 3D ANALYSIS - PHOTOPOLYMERIZATION, 2004, 170 :169-273
[10]   Two-photon polymerisation for three-dimensional micro-fabrication [J].
Wu, Shuhui ;
Serbin, Jesper ;
Gu, Min .
JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY, 2006, 181 (01) :1-11