Study of buried interfaces in Fe/Si multilayer by hard x-ray emission spectroscopy

被引：0

作者：

Verma, Hina ^{[1
]}

Le Guen, Karine ^{[1
]}

Delaunay, Renaud ^{[1
]}

Ismail, Iyas ^{[1
]}

Ilakovac, Vita ^{[1
,2
]}

Rueff, Jean Pascal ^{[1
,3
]}

Zheng, Yunlin Jacques ^{[4
]}

Jonnard, Philippe ^{[1
]}

机构：

[1] Sorbonne Univ, Fac Sci & Ingn, CNRS, UMR,Lab Chim Phys Mat & Rayonnement, 4 Pl Jussieu, F-75252 Paris 05, France

[2] CY Cergy Univ, Dept Phys, Cergy Pontoise, France

[3] Synchrotron SOLEIL, Gif Sur Yvette, France

[4] Sorbonne Univ, CNRS, UMR 7588, Inst NanoSci Paris INSP, Paris, France

来源：

SURFACE AND INTERFACE ANALYSIS | 2021年 / 53卷 / 12期

关键词：

buried interfaces; multilayer; x-ray emission spectroscopy; TEMPERATURE; RESOLUTION; SILICON; GROWTH; FILMS;

D O I：

10.1002/sia.7005

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Hard x-ray emission spectroscopy (XES) has been used to study buried layers and interfaces in a Fe/Si periodic multilayer. Until now, buried layers could be studied using the XES in the soft x-ray range. Here, we extend the methodology to study the buried interfaces in hard x-ray region (photon energy >= 5 keV). We report the formation of FeSi2 at all the interfaces with thicknesses of 1.4 nm. X-ray reflectivity measurements enable us to deduce the structure and thickness of the multilayer stack, thereby confirming the presence of FeSi2.

引用

页码：1043 / 1047

页数：5

共 26 条

[1] The GALAXIES inelastic hard X-ray scattering end-station at Synchrotron SOLEIL [J].