Ferroelectric properties of lead strontium titanate thin films by RF magnetron sputtering

被引：0
|
作者：
Fujii, T [1 ]
Du, J [1 ]
Karaki, T [1 ]
Adachi, M [1 ]
机构：
[1] Toyama Prefectural Univ, Dept Elect & Informat, Fac Engn, Kosugi, Toyama 9390398, Japan
来源：
JOURNAL OF THE KOREAN PHYSICAL SOCIETY | 2003年 / 42卷
关键词：
(Pb; Sr)TiO3; RF magnetron sputtering; dielectric and ferroelectric properties; FeRAM;
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Pb-rich ferroelectric (Pb,Sr)TiO3 (PST) thin film were fabricated by RF magnetron sputtering using three types of target on Ir(111)/SiO2/Si and Ir(100)/SrTiO3(100) substrates. With using two types of ceramics PST target (Pb/Sr-35/65 and 75/25), prepared PST films showed polycrystalline with a large Ti content compared to the stoichiometric value. To arrange the Pb/(Pb+Sr) and Ti/(Pb+Sr) ratio stoichiometry, third type of a multi-element target, which was comprised of calcined PbO pellets, Ti chips and ceramics SrTiO3 target, was used. After composition control, epitaxial PST thin film was obtained, and its remanent polarization and coercive field were 30 muC/cm(2) and 60 kV/cm, respectively.
引用
收藏
页码：S1178 / S1181
页数：4
相关论文
共 50 条
  • [41] Bi4-xLaxTi3O12 ferroelectric thin films prepared by RF magnetron sputtering
    Li, Xing'ao
    Liu, Zui
    Zuo, Anyou
    Yuan, Zuobin
    Yang, Jianping
    Yao, Kailun
    HIGH-PERFORMANCE CERAMICS V, PTS 1 AND 2, 2008, 368-372 : 109 - +
  • [42] Microstructure and properties of indium tin oxide thin films deposited by RF-magnetron sputtering
    LI ShitaoQIAO XueliangCHEN JianguoJIA FangWU ChangleState Key Laboratory of Plastic Forming Simulation and Die Mould TechnologyHuazhong University of Science and TechnologyWuhan China
    北京科技大学学报, 2006, (08) : 743 - 743
  • [43] Microstructure and properties of indium tin oxide thin films deposited by RF-magnetron sputtering
    Li Shitao
    Qiao Xueliang
    Chen Jianguo
    Jia Fang
    Wu Changle
    RARE METALS, 2006, 25 (04) : 359 - 364
  • [44] Effect of molybdenum doping on the electrochromic properties of tungsten oxide thin films by RF magnetron sputtering
    Madhavi, V.
    Kumar, P. Jeevan
    Kondaiah, P.
    Hussain, O. M.
    Uthanna, S.
    IONICS, 2014, 20 (12) : 1737 - 1745
  • [45] Effects of annealing treatment on the properties of CZTSe thin films deposited by RF-magnetron sputtering
    Fan, Ping
    Zhao, Jun
    Liang, Guang-xing
    Gu, Di
    Zheng, Zhuang-hao
    Zhang, Dong-ping
    Cai, Xing-min
    Luo, Jing-ting
    Ye, Fan
    JOURNAL OF ALLOYS AND COMPOUNDS, 2015, 625 : 171 - 174
  • [46] Influence of Substrate Temperature on the Properties of Nanostructured ZnO Thin Films Grown by RF Magnetron Sputtering
    H. Mahdhi
    Z. Ben Ayadi
    J. L. Gauffier
    K. Djessas
    Journal of Electronic Materials, 2016, 45 : 557 - 565
  • [47] Hydrophilic properties of nano-TiO2 thin films deposited by RF magnetron sputtering
    Ye, Q.
    Liu, P. Y.
    Tang, Z. F.
    Zhai, L.
    VACUUM, 2007, 81 (05) : 627 - 631
  • [48] Electronic, Optical and Electrical Properties of Nickel Oxide Thin Films Grown by RF Magnetron Sputtering
    Park, Chanae
    Kim, Juhwan
    Lee, Kangil
    Oh, Suhk Kun
    Kang, Hee Jae
    Park, Nam Seok
    APPLIED SCIENCE AND CONVERGENCE TECHNOLOGY, 2015, 24 (03): : 72 - 76
  • [49] INFLUENCE OF SUBSTRATE MATERIALS ON THE STRUCTURAL PROPERTIES OF ZNO THIN FILMS PREPARED BY RF MAGNETRON SPUTTERING
    Ahmad, S.
    Sin, N. D. Md
    Roslan, Liyana
    Pahroraji, Hazriel Faizal
    Alias, S. K.
    Sulaiman, S. A.
    Hashim, Siti Mardini
    Berhan, M. N.
    Rusop, M.
    JURNAL TEKNOLOGI, 2015, 76 (09): : 53 - 56
  • [50] Microstructure and properties of indium tin oxide thin films deposited by RF-magnetron sputtering
    LI Shitao
    RareMetals, 2006, (04) : 359 - 364
12345