Determination of the coincidence lattice of an ultra thin Al2O3 film on Ni3Al(111)

被引：73

作者：

Degen, S ^{[1
]}

Krupski, A ^{[1
]}

Kralj, M ^{[1
]}

Langner, A ^{[1
]}

Becker, C ^{[1
]}

Sokolowski, M ^{[1
]}

Wandelt, K ^{[1
]}

机构：

[1] Inst Physikal & Theoret Chem, D-53115 Bonn, Germany

来源：

SURFACE SCIENCE | 2005年 / 576卷 / 1-3期

关键词：

aluminum; nickel; aluminum oxide; thin film; coincidence lattice; STM; SPA-LEED;

D O I：

10.1016/j.susc.2004.12.020

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Spot profile analysis low energy electron diffraction (SPA-LEED) and low temperature scanning tunneling microscopy (LT-STM) measurements were performed on an ultra thin alumina film grown at 1000 K in an oxygen atmosphere on Ni3Al(111). By the aid of these two experimental techniques it has been shown that the alumina film exhibits a large superstructure with a lattice constant of 4.16 nm. The unit cell of this superstructure has a commensurate (root67 x root67)R47.784degrees relation to the Ni3Al(1 1 1) substrate lattice. (C) 2005 Elsevier B.V. All rights reserved.

引用

页码：L57 / L64

页数：8

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