Patterning colloidal films via evaporative lithography

被引：166
作者：
Harris, Daniel J. [1 ]
Hu, Hua
Conrad, Jacinta C.
Lewis, Jennifer A.
机构：
[1] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA
[2] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA
[3] Procter & Gamble Co, Corp Engn Tech Lab, W Chester, OH 45069 USA
[4] Philip Morris Inc, INEST Grp, Postgrad Program, Richmond, VA 23234 USA
来源：
PHYSICAL REVIEW LETTERS | 2007年 / 98卷 / 14期
关键词：
D O I：
10.1103/PhysRevLett.98.148301
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
We investigate evaporative lithography as a route for patterning colloidal films. Films are dried beneath a mask that induces periodic variations between regions of free and hindered evaporation. Direct imaging reveals that particles segregate laterally within the film, as fluid and entrained particles migrate towards regions of higher evaporative flux. The films exhibit remarkable pattern formation that can be regulated by tuning the initial suspension composition, separation distance between the mask and underlying film, and mask geometry.
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页数：4
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