Autophobic dewetting of a thin polystyrene ( PS) layer on a cross-linked PS film has been studied with optical microscopy and neutron reflection. For two different cross-linking densities, the increase in contact angle and the fast decrease of both dewetting velocity and slippage length as a function of dewetting time indicate that the dewetting dynamics is controlled by the penetration of free linear polymer chains into the cross-linked film and the concomitant stretching of the network mesh: the loss of entropy of the network favors dewetting, while partial chain interdiffusion between the layers increases friction and eventually stabilizes the top film. In a second series of experiment, we modified the entropy of the network by swelling it with linear chains from a reservoir of identical polymers prior to depositing the top PS film. Once equilibrated, a stable interface without considerable interdiffusion between network and topfilm was achieved. Without were observed. Copyright (C) EPLA, 2010
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Sch Energy & Chem Engn, Ulsan 44919, South Korea
Ulsan Natl Inst Sci & Technol UNIST, Ulsan 44919, South KoreaSch Energy & Chem Engn, Ulsan 44919, South Korea
Kim, Hyunhong
Shin, Tae Joo
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Ulsan Natl Inst Sci & Technol UNIST, UNIST Cent Res Facil, Ulsan 44919, South Korea
Ulsan Natl Inst Sci & Technol UNIST, Sch Nat Sci, Ulsan 44919, South KoreaSch Energy & Chem Engn, Ulsan 44919, South Korea
Shin, Tae Joo
Saalwaechter, Kay
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Martin Luther Univ Halle Wittenberg, Inst Phys NMR, D-06120 Halle, GermanySch Energy & Chem Engn, Ulsan 44919, South Korea
Saalwaechter, Kay
Park, Jongnam
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Sch Energy & Chem Engn, Ulsan 44919, South Korea
Ulsan Natl Inst Sci & Technol UNIST, Ulsan 44919, South KoreaSch Energy & Chem Engn, Ulsan 44919, South Korea
Park, Jongnam
Kim, So Youn
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Sch Energy & Chem Engn, Ulsan 44919, South Korea
Ulsan Natl Inst Sci & Technol UNIST, Ulsan 44919, South KoreaSch Energy & Chem Engn, Ulsan 44919, South Korea
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Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USANorthwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
Sun, Yan
Shull, Kenneth R.
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Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USANorthwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
Shull, Kenneth R.
Walko, Donald A.
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Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USANorthwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
Walko, Donald A.
Wang, Jin
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Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USANorthwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
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Nanjing Univ Technol, State Key Lab Mat Oriented Chem Engn, Nanjing 210009, Peoples R ChinaNanjing Univ Technol, State Key Lab Mat Oriented Chem Engn, Nanjing 210009, Peoples R China
Li, Xue-Mei
Shen, Zhou
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Nanjing Univ Technol, State Key Lab Mat Oriented Chem Engn, Nanjing 210009, Peoples R ChinaNanjing Univ Technol, State Key Lab Mat Oriented Chem Engn, Nanjing 210009, Peoples R China
Shen, Zhou
He, Tao
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Nanjing Univ Technol, State Key Lab Mat Oriented Chem Engn, Nanjing 210009, Peoples R ChinaNanjing Univ Technol, State Key Lab Mat Oriented Chem Engn, Nanjing 210009, Peoples R China