Probe-Based 3-D Nano lithography Using Self-Amplified Depolymerization Polymers

被引：148

作者：

Knoll, Armin W. ^{[1
]}

Pires, David ^{[1
]}

Coulembier, Olivier ^{[2
]}

Dubois, Philippe ^{[2
]}

Hedrick, James L. ^{[3
]}

Frommer, Jane ^{[3
]}

Duerig, Urs ^{[1
]}

机构：

[1] IBM Res Zurich, CH-8803 Ruschlikon, Switzerland

[2] Univ Mons, Lab Polymer & Composite Mat, B-7000 Mons, Belgium

[3] IBM Res Almaden, San Jose, CA 95120 USA

来源：

ADVANCED MATERIALS | 2010年 / 22卷 / 31期

关键词：

HIGH-SPEED; FABRICATION; SILICON;

D O I：

10.1002/adma.200904386

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

3D patterning by means of probe-assisted thermal decomposition has been achieved on phthalaldehyde polymer films with 1 nm vertical resolution and 40 nm lateral resolution Highly efficient patterning is enabled by a self-amplified depolymerization mechanism. Pixel writing speeds on the order of microseconds are demonstrated

引用

收藏

页码：3361 / +

页数：6

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