Growth of P-type 4H-SiC single crystals by physical vapor transport using aluminum and nitrogen co-doping

被引:22
作者
Eto, Kazuma [1 ]
Suo, Hiromasa [1 ,2 ]
Kato, Tomohisa [1 ]
Okumura, Hajime [1 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, 16-1 Onogawa, Tsukuba, Ibaraki 3058569, Japan
[2] Showa Denko Co Ltd, Minato Ku, 1-13-9 Shiba Daimon, Tokyo 1058518, Japan
关键词
Doping; Growth from vapor; Single-crystal growth; Semiconducting silicon compounds; SILICON-CARBIDE; BULK CRYSTALS; AL;
D O I
10.1016/j.jcrysgro.2017.04.025
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
P-type 4H-silicon carbide (SiC) crystal growth has been achieved by physical vapor transport using aluminum and nitrogen co-doping. Aluminum carbide with a two-zone heating furnace was used for p-type doping, and yielded homogenous aluminum doping during SiC crystal growth by physical vapor transport. The 4H-SiC polytype with high-aluminum doping was unstable, but aluminum-nitrogen co doping improved its stability. We grew p-type 4H-SiC bulk crystals of less than 90 m Omega cm by using co-doping. Secondary-ion mass spectrometry and Raman spectroscopy showed that the crystal growth of highly doped p-type SiC can be achieved by using the physical vapor transport method. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:154 / 158
页数:5
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