Low-pressure PECVD of nanoparticles in carbon thin films from Ar/H2/C2H2 plasmas:: Synthesis of films and analysis of the electron energy distribution function

被引:7
作者
Camero, Manuel
Gordillo-Vazquez, Francisco J.
Gomez-Aleixandre, Cristina
机构
[1] CSIC, Inst Mat Madrid, E-28049 Madrid, Spain
[2] CSIC, Inst Opt, E-28006 Madrid, Spain
关键词
carbon nanoparticles; C2H2; OES; plasma EEDF; RF-CVD;
D O I
10.1002/cvde.200606554
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
A study of the synthesis of carbon nanoparticles embedded in carbon thin films deposited by radiofrequency (RF) (13.56 MHz) Ar/H-2 (4%)/C2H2 plasmas is presented. The carbon nanospheres exhibit an amorphous structure that is clearly observed at 300 W, under 0.1 Torr, and grows in size with increasing C2H2 between 1% and 20%. Above a C2H2 concentration threshold (20% in this case) carbon nanoparticles are no longer formed. In order to study possible changes in the plasma kinetics, optical emission spectroscopy (OES) is used to evaluate the electron temperature while changing the C2H2 concentration. In addition, an analysis of the temporal evolution of the electron energy distribution function (EEDF) is carried out for various C2H2 concentrations considering the effects produced by electron-vibrational superelastic collisions and relative concentration of excited Ar atoms. Finally, the morphological and tribological features of the deposited films are characterized.
引用
收藏
页码:326 / 334
页数:9
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