Plasma enhanced chemical vapor deposition of zirconium nitride thin films

被引：0
|
作者：
Atagi, LM [1 ]
Samuels, JA [1 ]
Smith, DC [1 ]
Hoffman, DM [1 ]
机构：
[1] LOS ALAMOS NATL LAB,LOS ALAMOS,NM 87545
来源：
COVALENT CERAMICS III - SCIENCE AND TECHNOLOGY OF NON-OXIDES | 1996年 / 410卷
关键词：
D O I：
暂无
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：289 / 294
页数：6
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