Second order effects of aspect ratio variations in high sensitivity grating couplers

被引:4
作者
Darwish, N.
Dieguez, L.
Moreno, M.
Munoz, F.
Mas, R.
Mas, J.
Samitier, J.
Nilsson, B.
Petersson, G.
机构
[1] Univ Barcelona, Dept Elect, E-08028 Barcelona, Spain
[2] CSIC, Dept Micro & NanoSistemas, Inst Microelect Barcelona, CNM, Bellaterra 08193, Spain
[3] Chalmers, Nanofabricat Lab MC2, S-41296 Gothenburg, Sweden
关键词
optical biosensor; grating coupler; finite depth grating; e-beam lithography;
D O I
10.1016/j.mee.2007.01.179
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In the following article we present our developments on how the geometrical parameters modify a grating-coupler sensitivity. Different sensors were fabricated, starting from the thin grating approximation (TGA), where the grating thickness is deprecated. Then, these devices were modified by varying etching depths and duty cycles. The sensors were modeled utilizing the equivalent layer approximation (ELA), and then the coupling angles were measured in the optical bench, showing an excellent agreement between model and reality. The same approximation was used to investigate how to improve the sensitivity of these devices. Another focus of attention was the integration of screen SiO2 layers over some grating paths for in-coupling and reference purposes. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:1775 / 1778
页数:4
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