The orientational relationship between monoclinic β-Ga2O3 and cubic NiO

被引:18
作者
Nakagomi, Shinji [1 ]
Kubo, Shohei [1 ]
Kokubun, Yoshihiro [1 ]
机构
[1] Ishinomaki Senshu Univ, Fac Sci & Engn, Dept Informat Technol & Elect, Ishinomaki, Miyagi 9868580, Japan
关键词
Crystal structure; X-ray diffraction; Gallium compounds; Oxides; Semiconducting gallium compounds; OPTICAL-PROPERTIES; FILMS; DEPOSITION;
D O I
10.1016/j.jcrysgro.2016.04.023
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The orientational relationship between beta-Ga2O3 and NiO was studied by X-ray diffraction measurements and cross-sectional high resolution transmission electron microscopy. A beta-Ga2O3 thin film was formed on a (100) NiO layer on a (100) MgO substrate by gallium evaporation in an oxygen plasma. It was found that the resulting beta-Ga2O3 had a four-fold domain structure satisfying both (100) beta-Ga2O3 parallel to (100) NiO and (010) beta-Ga2O3 parallel to {011} NiO. A gamma-Ga2O3 layer was observed at the interface between the beta-Ga2O3 and the NiO. An NiO film was also formed on a (100) beta-Ga2O3 single-crystal substrate by the sol gel method. An epitaxial (100) NiO film was formed on a (100) beta-Ga2O3 substrate, and satisfied (011) NiO parallel to (010) beta-Ga2O3. The crystal orientations of beta-Ga2O3 on (100) NiO and NiO on (100) beta-Ga2O3 can be explained using atomic arrangement models of the (100) plane of NiO and the (100) plane of beta-Ga2O3. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:73 / 77
页数:5
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