Predicting NMOS device radiation response at different dose rates in γ-ray environment

被引:11
作者
He, BP [1 ]
Wang, GZ [1 ]
Zhou, H [1 ]
Gong, JC [1 ]
Luo, YH [1 ]
Jiang, JH [1 ]
机构
[1] NW Inst Nucl Technol, Xian 710613, Peoples R China
关键词
irradiation response; anneal; dose rate; failure dose;
D O I
10.7498/aps.52.188
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Linear response theory was used to predict threshold-voltage shifts for CC4007-NMOS device at dose rates of 0.1, 2.3, 44 and 91 rad( Si)/s. These predictions were compared with the threshold- voltage shifts obtained after Co-60 irradiations actually performed at these dose rates, and the agreement is excellent. Also, we use the linear response theory to predict the response of CC4007-NMOS device during radiation and 25degreesC annealling for high and low-dose-rates. According to the predictions, under the same conditions of radiation and annealling, the threshold-voltage shifts caused by high dose-rate irradiation after room temperature annealling were equal to that by low-dose-rate irradiation within the limit of error, but the total times for both were the same. Finally, the failure doses for CC4007-NMOS device at different dose rates of irradiation were predicted also using the linear response theory.
引用
收藏
页码:188 / 191
页数:4
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