Structural stability and band alignment in the c-plane ZnO/GaN heterostructure

被引:1
作者
Wang, Jianli [1 ,2 ,3 ]
Liu, Jiangtao [1 ]
Xue, Mengmeng [1 ]
Bai, Dongmei [4 ]
Stampfl, Catherine [2 ]
机构
[1] China Univ Min & Technol, Sch Phys, Xuzhou 221116, Jiangsu, Peoples R China
[2] Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
[3] Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Jiangsu, Peoples R China
[4] China Univ Min & Technol, Sch Math, Xuzhou 221116, Jiangsu, Peoples R China
关键词
ZnO; GaN; defective surface formation energy; band offsets; ELECTRONIC-PROPERTIES; ZNO; GAN; ELECTROLUMINESCENCE; SURFACE; FABRICATION; ADSORPTION; INTERFACE; NANOWIRES; AIN;
D O I
10.1088/1361-6641/ab31d7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The structural stability and electronic properties of ZnO on c-plane GaN substrates with and without a Ga-adlayer or Ga-bilayer are studied by first-principles calculations. The ZnO/GaN heterostructures are determined by a layer-by-layer mode from the initial adsorption of the alternative Zn and oxygen atomic layers of the first ZnO unit cell on c-plane GaN surfaces. The Ga-adlayer occupies the T-4 sites of GaN (0001) substrates and improves the ordered structure of the grown ZnO. The atomic and the electronic structures are systematically analyzed for the optimized ZnO/GaN heterojunction. The perfect Zn-terminated ZnO/GaN (000 (1) over bar) heterostructure has a band gap 2.57 eV and small band offset values, which is a potential candidate for GaN-based semiconductor heterojunction field-effect transistors devices. The Ga-adlayer induces in-gap states and causes a decrease of the band offsets for the Zn-terminated ZnO/GaN (000 (1) over bar) heterojunction.
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页数:8
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