Observation of electron excitation into silicon conduction band by slow-ion surface neutralization

被引:1
作者
Shchemelinin, S. [1 ]
Breskin, A. [1 ]
机构
[1] Weizmann Inst Sci, Dept Astrophys & Particle Phys, IL-7610001 Rehovot, Israel
来源
JOURNAL OF INSTRUMENTATION | 2017年 / 12卷
关键词
Charge transport and multiplication in solid media; Interaction of radiation with matter; Radiation-induced secondary-electron emission; Solid state detectors; LAYER;
D O I
10.1088/1748-0221/12/03/P03020
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Bare reverse biased silicon photodiodes were exposed to 3 eV He+, Ne+, Ar+, N2+, N+ and H2O+ ions. In all cases an increase of the reverse current through the diode was observed. This effect and its dependence on the ionization energy of the incident ions and on other factors are qualitatively explained in the framework of Auger-type surface neutralization theory. Amplification of the ion-induced charge was observed with an avalanche photodiode under high applied bias. The observed effect can be considered as ion-induced internal potential electron emission into the conduction band of silicon. To the best of our knowledge, no experimental evidence of such effect was previously reported. Possible applications are discussed.
引用
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页数:11
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