Variation of microstructure and composition of the Cr2AlC coating prepared by sputtering at 370 and 500 °C

被引：65
作者：
Li, J. J. [1 ,2 ]
Hu, L. F. [1 ,2 ]
Li, F. Z. [1 ,2 ]
Li, M. S. [1 ]
Zhou, Y. C. [1 ]
机构：
[1] Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China
[2] Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China
来源：
SURFACE & COATINGS TECHNOLOGY | 2010年 / 204卷 / 23期
基金：
美国国家科学基金会;
关键词：
Cr2AlC coating; MAX phase; Magnetron sputtering; Microstructure; Substrate temperature; alpha-(Cr; Al)(2)O-3; PHASE THIN-FILMS; AB-INITIO CALCULATIONS; SELECT MAX PHASES; TRIBOLOGICAL BEHAVIOR; M(N+1)AX(N) PHASES; DEPOSITED CHROMIUM; OXIDATION BEHAVIOR; VAPOR DEPOSITS; NITRIDE FILMS; BULK CR2ALC;
D O I：
10.1016/j.surfcoat.2010.04.067
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Cr2AlC coating was deposited at 370 and 500 degrees C by D.C. magnetron sputtering from an as-synthesized bulk Cr2AlC target. The phase composition and preferential orientation of the coating were investigated using XRD, and the microstructure of the coating was characterized by TEM. Results indicated that Cr2AlC coating with a strong (110) preferential orientation could be obtained. The coating microstructure was clearly affected by the deposition temperature. At 370 degrees C, the deposited coating possessed a triple-layered structure with an alpha-(Cr, Al)(2)O-3 inner layer, an amorphous intermediate layer and a crystalline Cr2AlC outer layer. However, the coating deposited at 500 degrees C had a single-layered structure consisting of crystalline Cr2AlC layer. The growth mechanism of the Cr2AlC coating at different deposition temperatures is discussed. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码：3838 / 3845
页数：8
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