Flexible amorphous-silicon non-volatile memory

被引:1
作者
Darbanian, Nazanin [1 ]
Venugopal, Sameer M. [1 ]
Gopalan, Shrinivas G. [1 ]
Allee, David R. [1 ]
Clark, Lawrence T. [1 ]
机构
[1] Arizona State Univ, Flexible Display Ctr, Tempe, AZ 85284 USA
关键词
Amorphous silicon; thin-film transistors; flexible electronics; non-volatile memory; threshold-voltage degradation; display backplane technology; THIN-FILM TRANSISTORS;
D O I
10.1889/JSID18.5.346
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The development of a flexible, rewritable, non-volatile memory (NVM) that is implemented on a standard, low-temperature a-Si:H process without additional mask steps is reported. This NVM is a part of a flexible-display system. Each NVM cell is composed of differentially configured thin-film-transistors (TFTs). The cell reads out one of two stable states depending on the relative threshold voltages of the differentially configured TFTs. Information is stored in each cell by increasing the threshold voltage of one differential TFT or the other, utilizing the well-known electrical-stress degradation intrinsic to a-Si:H TFTs. The stored information is retained indefinitely with no applied power. A test array of individually addressable NVM cells has been successfully fabricated and tested on flexible stainless-steel substrates. Read and write operation, as well as preliminary reliability measurements, are described. The design is readily scalable to large memory arrays.
引用
收藏
页码:346 / 350
页数:5
相关论文
共 11 条
  • [1] Electrical instability of hydrogenated amorphous silicon thin-film transistors for active-matrix liquid-crystal displays
    Chiang, CS
    Kanicki, J
    Takechi, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (9A): : 4704 - 4710
  • [2] DC-gate-bias stressing of a-Si : H TFTs fabricated at 150°C on polyimide foil
    Gleskova, H
    Wagner, S
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2001, 48 (08) : 1667 - 1671
  • [3] HOLMES AJ, 1994, P 1994 INT S CIRC SY, V6, P351
  • [4] Amorphous silicon memory arrays
    Jackson, W. B.
    Elder, R.
    Hamburgen, W.
    Jeans, A.
    Kim, H. -J.
    Luo, H.
    Mei, P.
    Perlov, C.
    Taussig, C.
    Branz, H.
    Stradin, P.
    Wang, Q.
    Ward, S.
    Braymen, S.
    Jeffery, F.
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 2006, 352 (9-20) : 859 - 862
  • [5] KUO Y, 2006, APPL PHYS LETT, V89
  • [6] APPLICATION OF AMORPHOUS MATERIALS TO COMPUTER MEMORIES
    NEALE, RG
    ASELTINE, JA
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1973, ED20 (02) : 195 - 205
  • [7] OROURKE SM, 2008, SID S, V39, P442
  • [8] THE PHYSICS OF AMORPHOUS-SILICON THIN-FILM TRANSISTORS
    POWELL, MJ
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (12) : 2753 - 2763
  • [9] Thermadam SCP, 2007, P NONV MEM TECHN S, P86
  • [10] Threshold-voltage recovery of a-S:H digital circuits
    Venugopal, Sameer M.
    Allee, David B.
    Li, Zi
    Clark, Lawrence T.
    [J]. JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY, 2006, 14 (10-12) : 1053 - 1057