Transport and magnetic properties of ZnCo2O4/Si heterostructures grown by radio frequency magnetron sputtering

被引:11
作者
Chen, Z. [1 ]
Wen, X. L. [2 ]
Niu, L. W. [1 ]
Duan, M. [1 ]
Zhang, Y. J. [1 ]
Dong, X. L. [1 ]
Zhang, R. L. [1 ]
Chen, C. L. [1 ]
机构
[1] Northwestern Polytech Univ, Sch Sci, Key Lab Space Appl Phys & Chem, Minist Educ, Xian 710072, Peoples R China
[2] Northwestern Polytech Univ, State Key Lab Solidificat Proc, Xian 710072, Peoples R China
基金
中国国家自然科学基金;
关键词
Zinc cobalt oxide; Silicon; Heterostructures; Transport properties; Magnetic properties; Radio frequency magnetron sputtering; SEMICONDUCTOR ZNCO2O4; ION-IMPLANTATION; SILICON; SI; FERROMAGNETISM; SUBSTRATE;
D O I
10.1016/j.tsf.2014.10.103
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report a growth of ZnCo2O4/Si heterostructures by using radio frequency magnetron sputtering (RFMS) method, and characterizations of their transport and magnetic properties. It is found that the ZnCo2O4/Si heterostructures exhibit a good rectifying behavior at four measured temperatures of 100 K, 150 K, 200 K, and 290 K. The energy band structure reveals that the electron is the mainly contributing factor to the current of the ZnCo2O4/Si heterostructures. The transport behaviors of these heterostructures can be qualitatively explained by diffusion or recombination in the space charge region at low voltages ranging from 0.16 V to 0.3 V, and the space-charge-limited current conduction mechanism plays a main role when the voltage is higher than 0.3 V. The magnetic measurements of the ZnCo2O4/Si heterostructures indicate a strong ferromagnetic behavior at oxygen pressures ranging from 1.333 Pa to 6.665 Pa. It is believed that this work would open perspectives for ZnCo2O4/Si heterostructure-based devices. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:90 / 94
页数:5
相关论文
共 35 条
[1]  
Bae M. Y., 2013, J APPL PHYS, V8, P113
[2]  
Belghazi Y., 2009, J APPL PHYS, V11, P105
[3]  
Bian X. M., 2008, OPT ENG, V6, P47
[4]   Current transport studies of ZnO/p-Si heterostructures grown by plasma immersion ion implantation and deposition [J].
Chen, XD ;
Ling, CC ;
Fung, S ;
Beling, CD ;
Mei, YF ;
Fu, RKY ;
Siu, GG ;
Chu, PK .
APPLIED PHYSICS LETTERS, 2006, 88 (13)
[5]   p-ZnO/n-Si heterojunction:: Sol-gel fabrication, photoresponse properties, and transport mechanism [J].
Dutta, M. ;
Basak, D. .
APPLIED PHYSICS LETTERS, 2008, 92 (21)
[6]   Aligned Al:ZnO nanorods on Si with different barrier layers for optoelectronic applications [J].
Holloway, Terence ;
Mundle, Rajeh ;
Dondapati, Hareesh ;
Bahoura, M. ;
Pradhan, A. K. .
CHEMICAL PHYSICS LETTERS, 2012, 534 :48-53
[7]   Structural and Dielectric Properties of Zinc Cobalt Oxide (ZnCo2O4) Ceramics [J].
Hymavathi, B. ;
Kumar, B. Rajesh ;
Rao, T. Subba .
FUNCTIONAL MATERIALS-BOOK, 2012, 1461 :299-302
[8]   Controlled shallow single-ion implantation in silicon using an active substrate for sub-20-keV ions [J].
Jamieson, DN ;
Yang, C ;
Hopf, T ;
Hearne, SM ;
Pakes, CI ;
Prawer, S ;
Mitic, M ;
Gauja, E ;
Andresen, SE ;
Hudson, FE ;
Dzurak, AS ;
Clark, RG .
APPLIED PHYSICS LETTERS, 2005, 86 (20) :1-3
[9]   Size dependent magnetization and high-vacuum annealing enhanced ferromagnetism in Zn1-xCoxO nanowires [J].
Jian, Wen-Bin ;
Chen, I-Jan ;
Liao, Tai-Ching ;
Ou, Yi-Ching ;
Nien, Cheng-Hsun ;
Wu, Zhong-Yi ;
Chen, Fu-Rong ;
Kai, Ji-Jung ;
Lin, Juhn-Jong .
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2008, 8 (01) :202-211
[10]   Fabrication and Characterization of Solution Processed n-ZnO Nanowire/p-Si Heterojunction Device [J].
Kathalingam, A. ;
Rhee, Jin-Koo .
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2012, 12 (09) :6948-6954