Novel fabrication technique of TiNi shape memory alloy film using separate Ti and Ni targets

被引：52

作者：

Ohta, A ^{[1
]}

Bhansali, S ^{[1
]}

Kishimoto, I ^{[1
]}

Umeda, A ^{[1
]}

机构：

[1] Natl Res Lab Metrol, Tsukuba, Ibaraki 3058563, Japan

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 2000年 / 86卷 / 03期

关键词：

shape memory alloy; TiNi; phase transformation; MEMS;

D O I：

10.1016/S0924-4247(00)00449-0

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper proposes a novel fabrication technique of TiNi shape memory alloy (SMA) film and verifies the validity by showing the actual fabrication process and the final results. Special attention is paid to the characterization of differential scanning calorimetry (DSC). An essential part of the fabrication process is the co-sputtering from separate pure Ti and Ni targets. Go-sputtering is carried out using a multi-target sputtering system where RF power for each target can be controlled independently. As-sputtered film is vacuum-annealed. The phase transformation behavior of the fabricated film is investigated by DSC and temperature-controlled X-ray diffractometry (XRD). Finally, shape recovery behavior is observed. The proposed novel fabrication technique is validated by these results. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：165 / 170

页数：6

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