Dynamics of ferroelectric 180° domain walls at engineered pinning centers

被引:5
作者
McGilly, Leo J. [1 ]
Feigi, Ludwig [1 ,2 ]
Setter, Nava [1 ,3 ]
机构
[1] Ecole Polytech Fed Lausanne, Swiss Fed Inst Technol, Ceram Lab, CH-1015 Lausanne, Switzerland
[2] KIT, Inst Photon Sci & Synchrotron Radiat, Hermann von Helmholtz Pl 1, D-76344 Eggenstein Leopoldshafen, Germany
[3] Tel Aviv Univ, Dept Mat Sci & Engn, IL-69978 Ramat Aviv, Israel
基金
瑞士国家科学基金会; 欧洲研究理事会;
关键词
THIN-FILMS; GRAIN-BOUNDARIES; MOTION; NUCLEATION; NANOSCALE; CERAMICS; BEHAVIOR; DEFECTS;
D O I
10.1063/1.4993576
中图分类号
O59 [应用物理学];
学科分类号
摘要
The interaction between domain walls and pinning centers in ferroelectrics is of great interest from both fundamental and practical points of view. In this work, we show that, counter to intuition, the apparent velocity of domain walls can increase as the defect density increases. However, when we closely investigate the propagating front of the domain wall, we find that it is not unified but can be rough, indicating the presence of multiple nucleated domains in advance of the primary wall. We therefore ascribe the increased apparent velocity with defect density to actually derive from nucleation-aided motion. To further investigate the effect of engineered pinning centers, we spatially confined the defect regions and then propagated domain walls in that direction. We found that, given a sufficiently high defect density, walls can be pinned indefinitely at sub-threshold voltages. Finally, we outline a method to create domain wall propagation channels in which the wall is confined to a low defect region bordered by high defect density regions. Published by AIP Publishing.
引用
收藏
页数:5
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