The deposition mechanism of atmospheric pressure glow plasma polymerized hexafluoropropene: Gas phase analysis of HFP plasma

被引：2
作者：
Ozaki, Ren [1 ]
Kogoma, Masuhiro [1 ]
Tanaka, Kunihito [1 ]
机构：
[1] Sophia Univ, Fac Sci & Technol, Dept Chem, Chiyoda Ku, Tokyo 102, Japan
来源：
THIN SOLID FILMS | 2010年 / 518卷 / 13期
关键词：
Atmospheric pressure glow plasma; Plasma deposition; Deposition mechanism; ADHESIVE STRENGTH; COATINGS;
D O I：
10.1016/j.tsf.2009.11.039
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The relationship between the plasma conditions and the atmospheric pressure glow plasma deposition characteristics of the polyhexafluoropropene film, such as the film configuration, the deposition rate and products in plasma, was investigated. The higher deposition rate and the higher monomer use efficiency were obtained at a lower hexafluoropropene (monomer) concentration and a lower total gas flow rate (longer residence time in the plasma region). However, an extreme long residence time generated some granular deposits. And five gas phase products were detected by gas phase analysis. We considered that C(2)F(4) and C(4)H(8), which have double bond, were related to the deposition deeply. (C) 2009 Elsevier B.V. All rights reserved.
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页码：3566 / 3569
页数：4
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