Mechanical properties of thin films and nanometric multilayers using tensile testing and synchrotron X-ray diffraction

X-Ray diffraction (XRD) in combination with tensile testing is a very attractive tool for investigating the elastic behavior and further fracture or plasticity of metallic thin films and multilayers. Such studies are carried out with synchrotron X-ray sources allowing for several diffraction and loading conditions to be investigated and hence for great precision to be achieved. XRD is phase selective and allows for the study of individual layers or phase contributions. The method is based on a length scale change to relate in-grain elastic strains to tensile macrostresses. Hence, it requires the modeling of the grain interactions in view of the structure of the films (morphology, texture). The paper is illustrated with studies carried out on elastically isotropic tungsten (W) films, elastically anisotropic gold (Au) textured films, and nanometric tungsten/copper (W/Cu) multilayers.