Atomic and Electronic Structures of a Fullerene Molecule on a Ag/Si(111)√3x√3 Surface
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作者:
Jeong, Sukmin
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Chonbuk Natl Univ, Dept Phys, Jeonju 561756, South Korea
Chonbuk Natl Univ, Res Inst Phys & Chem, Jeonju 561756, South KoreaChonbuk Natl Univ, Dept Phys, Jeonju 561756, South Korea
Jeong, Sukmin
[1
,2
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机构:
[1] Chonbuk Natl Univ, Dept Phys, Jeonju 561756, South Korea
[2] Chonbuk Natl Univ, Res Inst Phys & Chem, Jeonju 561756, South Korea
We present first-principles total-energy calculations of a single fullerene (C-60) molecule on a Ag-terminated Si(111)root 3x root 3 surface (root 3-Ag), which can provide a deep understanding to the interesting atomic and electronic structures of C-60 overlayers on root 3-Ag. C-60 stably occupies the centers of the substrate triangles, and the on-top sites above Si and Ag atoms. In the most stable adsorption configuration with an adsorption energy of 0.87 eV, C-60 occupies a large Ag triangle site with a hexagon of C-60 facing the substrate. On a Si triangle site, unlike on the large Ag triangle site, a C-C bond that is shared by two adjacent hexagons takes the bottom position. Simulated scanning-tunneling microscopy (STM) images distinguish between the large Ag triangle and Si triangle configurations and are consistent with low-temperature STM observations [K. Tsuchie et al.: Phys. Rev. B 60 (1999) 11131]. Investigation of the energy band of the lowest-energy configuration reveals that C-60 weakly interacts with the substrate because the highest occupied molecular orbital and lowest unoccupied molecular orbital states of C-60 remain almost unchanged upon adsorption of C-60. However, slight upward shift of the S-1 band, responsible for the metallicity in root 3-Ag, is in contrast to the downward shifts for monovalent metal adatoms and gives rise to the decrease in the surface conductivity for C-60 adsorption.
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Tokyo Inst Technol, Dept Mat Sci & Engn, Midori Ku, Yokohama, Kanagawa 2268502, JapanTokyo Inst Technol, Dept Mat Sci & Engn, Midori Ku, Yokohama, Kanagawa 2268502, Japan
机构:
Chonbuk Natl Univ, Dept Phys, Jeonju 561756, South Korea
Chonbuk Natl Univ, Res Inst Phys & Chem, Jeonju 561756, South KoreaChonbuk Natl Univ, Dept Phys, Jeonju 561756, South Korea
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Inst Automat & Control Proc, Vladivostok 690041, RussiaInst Automat & Control Proc, Vladivostok 690041, Russia
Matetskiy, A. V.
Gruznev, D. V.
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Inst Automat & Control Proc, Vladivostok 690041, RussiaInst Automat & Control Proc, Vladivostok 690041, Russia
Gruznev, D. V.
Zotov, A. V.
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Inst Automat & Control Proc, Vladivostok 690041, Russia
Far Eastern State Univ, Fac Phys & Engn, Vladivostok 690000, Russia
Vladivostok State Univ Econ & Serv, Dept Elect, Vladivostok 690600, RussiaInst Automat & Control Proc, Vladivostok 690041, Russia
Zotov, A. V.
Saranin, A. A.
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Inst Automat & Control Proc, Vladivostok 690041, Russia
Far Eastern State Univ, Fac Phys & Engn, Vladivostok 690000, RussiaInst Automat & Control Proc, Vladivostok 690041, Russia
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Inst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Far Eastern Fed Univ, Sch Nat Sci, Vladivostok 690950, RussiaInst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Bondarenko, L. V.
Matetskiy, A. V.
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Inst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Far Eastern Fed Univ, Sch Nat Sci, Vladivostok 690950, RussiaInst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Matetskiy, A. V.
Yakovlev, A. A.
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Inst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Far Eastern Fed Univ, Sch Nat Sci, Vladivostok 690950, RussiaInst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Yakovlev, A. A.
Tupchaya, A. Y.
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Inst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Far Eastern Fed Univ, Sch Nat Sci, Vladivostok 690950, RussiaInst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Tupchaya, A. Y.
Gruznev, D. V.
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Inst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Far Eastern Fed Univ, Sch Nat Sci, Vladivostok 690950, RussiaInst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Gruznev, D. V.
Ryzhkova, M. V.
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Inst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Far Eastern Fed Univ, Sch Nat Sci, Vladivostok 690950, RussiaInst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Ryzhkova, M. V.
Tsukanov, D. A.
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Inst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Far Eastern Fed Univ, Sch Nat Sci, Vladivostok 690950, RussiaInst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Tsukanov, D. A.
Borisenko, E. A.
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Inst Automat & Control Proc FEB RAS, Vladivostok 690041, RussiaInst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Borisenko, E. A.
Chukurov, E. N.
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Inst Automat & Control Proc FEB RAS, Vladivostok 690041, RussiaInst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Chukurov, E. N.
Denisov, N. V.
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Inst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Far Eastern Fed Univ, Sch Nat Sci, Vladivostok 690950, RussiaInst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Denisov, N. V.
Vilkov, O.
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St Petersburg State Univ, St Petersburg 198504, RussiaInst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Vilkov, O.
Vyalikh, D. V.
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St Petersburg State Univ, St Petersburg 198504, Russia
Tech Univ Dresden, Inst Solid State Phys, D-01062 Dresden, GermanyInst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Vyalikh, D. V.
Zotov, A. V.
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Inst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Far Eastern Fed Univ, Sch Nat Sci, Vladivostok 690950, Russia
Vladivostok State Univ Econ & Serv, Dept Elect, Vladivostok 690600, RussiaInst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Zotov, A. V.
Saranin, A. A.
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机构:
Inst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia
Far Eastern Fed Univ, Sch Nat Sci, Vladivostok 690950, RussiaInst Automat & Control Proc FEB RAS, Vladivostok 690041, Russia