Molecular dynamics study of nanosilver particles for low-temperature lead-free interconnect applications

被引:30
作者
Dong, H [1 ]
Moon, KS [1 ]
Wong, CP [1 ]
机构
[1] Georgia Inst Technol, Sch Mat Sci & Engn, Atlanta, GA 30332 USA
基金
美国国家科学基金会;
关键词
molecular dynamics (MD); embedded atom method (EAM); nano lead-free interconnect;
D O I
10.1007/s11664-005-0178-2
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Molecular dynamics (MD) simulation was conducted to investigate the coalescence of Ag nanoparticles and their deposition on a gold substrate at various temperatures from 400 K to 1,000 K using the embedded atom method (EAM). Density distribution function, x-z plane projection, spreading index, and coalescence index were analyzed to gain more insight into the sintering and diffusion process. Simulation results showed that Ag and Au atoms can diffuse into each other significantly at a temperature of 1,000 K and reform the lattice structure after the temperature is cooled back to 400 K. Simulation data also demonstrated that even at a low temperature of 400 K, silver spheres can be collapsed and deposited on the substrate. Yet higher temperatures were helpful in enhancing the degree of collapsing and deposition.
引用
收藏
页码:40 / 45
页数:6
相关论文
共 28 条
[1]   DEVELOPMENT OF AN ANISOTROPIC CONDUCTIVE ADHESIVE FILM (ACAF) FROM EPOXY-RESINS [J].
ASAI, SI ;
SARUTA, U ;
TOBITA, M ;
TAKANO, M ;
MIYASHITA, Y .
JOURNAL OF APPLIED POLYMER SCIENCE, 1995, 56 (07) :769-777
[2]   EMBEDDED-ATOM METHOD - DERIVATION AND APPLICATION TO IMPURITIES, SURFACES, AND OTHER DEFECTS IN METALS [J].
DAW, MS ;
BASKES, MI .
PHYSICAL REVIEW B, 1984, 29 (12) :6443-6453
[3]   MESSUNG DES WIDERSTANDES DUNNER ISOLIERENDER SCHICHTEN ZWISCHEN GOLDKONTAKTEN IM BEREICH DES TUNNELEFFEKTES [J].
DIETRICH, I .
ZEITSCHRIFT FUR PHYSIK, 1952, 132 (02) :231-238
[4]   Molecular dynamics study on the coalescence of Cu nanoparticles and their deposition on the Cu substrate [J].
Dong, H ;
Moon, KS ;
Wong, CP .
JOURNAL OF ELECTRONIC MATERIALS, 2004, 33 (11) :1326-1330
[5]   Reliability investigations on conductive adhesive joints with emphasis on the mechanics of the conduction mechanism [J].
Dudek, R ;
Berek, H ;
Fritsch, T ;
Michel, B .
IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES, 2000, 23 (03) :462-469
[6]  
FOILES SM, 1983, PHYS REV LETT, V50, P1285
[7]   EVALUATION OF CONTACT RESISTANCE FOR ISOTROPIC ELECTRICALLY CONDUCTIVE ADHESIVES [J].
GAYNES, MA ;
LEWIS, RH ;
SARAF, RF ;
ROLDAN, JM .
IEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGY PART B-ADVANCED PACKAGING, 1995, 18 (02) :299-304
[8]   Molecular dynamics of a molten Cu droplet spreading on a cold Cu substrate [J].
Ge, R ;
Clapp, PC ;
Rifkin, JA .
SURFACE SCIENCE, 1999, 426 (01) :L413-L419
[9]  
Gilleo K., 1995, Soldering & Surface Mount Technology, P12, DOI 10.1108/eb037885
[10]  
Harris P. G., 1995, Soldering & Surface Mount Technology, P19, DOI 10.1108/eb037894